Tribochemical wear of silicon nitride against silicate and phosphate glasses

He, Hongtu; Xiao, Tongjin; Qiao, Qian; Yu, Jiaxin; Zhang, Yafeng

doi:10.1016/j.wear.2018.11.035

Cited by 6 publications

(1 citation statement)

References 39 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…The core of tribochemical mechanical polishing is the tribochemical reaction [22,23], which includes the tribochemical reaction under dry friction and the tribochemical reaction under wet conditions. The polishing solution used in tribochemical mechanical polishing does not contain free abrasives [24,25], the polishing solution is deionized water or chemical solution, and the workpiece material removal method is mostly removed by tribochemical wear [26,27]. Due to the advantages of good surface flatness and fewer scratches on the workpiece obtained by this method, it has attracted extensive the attention of many scholars.…”

Section: Introductionmentioning

confidence: 99%

Research of dry tribochemical mechanical polishing SiC with an innovation abrasive-catalytic abrasive cluster

Wang

Ding²,

Wang³

et al. 2023

Preprint

View full text Add to dashboard Cite

Abrasive particles have a crucial influence on the material removal rate and surface quality of the workpiece in tribochemical mechanical polishing. Therefore, this article selects a self-made catalytic abrasive cluster to polish the 6H-SiC and explore the removal mechanism of polishin silicon carbide in the new catalytic abrasive cluster. The tribochemical mechanical polishing test and friction and wear test of 6H-SiC were carried out with three different abrasives, and the evaluation parameters such as material removal rate, surface roughness and friction coefficient were obtained. Quanta 200 scanning electron microscope(SEM) and oxfobrdinca 250 energy dispersive spectrometer (EDS) and x-ray diffraction(XRD)diffractometer were used to observe the surface, analyze the elements and determine the composition of silicon carbide workpiece after tribochemical mechanical polishing. The experimental result shows that oxygen is produced in the tribochemical mechanical polishing of silicon carbide by catalytic abrasive cluster, which makes the silicon carbide surface generate SiO2 shear film that is easy to be removed. Comparing with iron-based white corundum mixed abrasive and Al2O3 abrasive, the catalytic abrasive cluster has better processability for 6H-SiC, and the material removal rate can reach to 42.928nm/min.

show abstract

Section: Introductionmentioning

confidence: 99%

Research of dry tribochemical mechanical polishing SiC with an innovation abrasive-catalytic abrasive cluster

Wang

Ding²,

Wang³

et al. 2023

Preprint

View full text Add to dashboard Cite

show abstract

Boundary slip and lubrication mechanisms of organic friction modifiers with effect of surface moisture

Yi,

Xu,

Jin

et al. 2024

Friction

View full text Add to dashboard Cite

Surface moisture or humidity impacting the lubrication property is a ubiquitous phenomenon in tribological systems, which is demonstrated by a combination of molecular dynamics (MD) simulation and experiment for the organic friction modifier (OFM)-containing lubricant. The stearic acid and poly-α-olefin 4cSt (PAO4) were chosen as the OFM and base oil molecules, respectively. The physical adsorption indicates that on the moist surface water molecules are preferentially adsorbed on friction surface, and even make OFM adsorption film thoroughly leave surface and mix with base oil. In shear process, the adsorption of water film and desorption OFM film are further enhanced, particularly under higher shear rate. The simulated friction coefficient (that is proportional to shear rate) increases firstly and then decreases with thickening water film, in good agreement with experiments, while the slip length shows a contrary change. The wear increases with humidity due to tribochemistry revealing the continuous formation and removal of Si-O-Si network. The tribological discrepancy of OFM-containing lubricant in dry and humid conditions is attributed to the slip plane’s transformation from the interface between OFM adsorption film and lubricant bulk to the interface between adsorbed water films. This work provides a new thought to understand the boundary lubrication and failure of lubricant in humid environments, likely water is not always harmful in oil lubrication systems.

show abstract

Evolution of HF etching rate of borosilicate glass by friction-induced damages

Qiao

2020

Applied Surface Science

View full text Add to dashboard Cite

Tribochemical wear of silicon nitride against silicate and phosphate glasses

Cited by 6 publications

References 39 publications

Research of dry tribochemical mechanical polishing SiC with an innovation abrasive-catalytic abrasive cluster

Research of dry tribochemical mechanical polishing SiC with an innovation abrasive-catalytic abrasive cluster

Boundary slip and lubrication mechanisms of organic friction modifiers with effect of surface moisture

Evolution of HF etching rate of borosilicate glass by friction-induced damages

Contact Info

Product

Resources

About