2016
DOI: 10.1016/j.promfg.2016.08.096
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Tribological Properties of High Hardness ta-CNx Coatings Deposited by Filtered Arc Deposition with Block-on-Ring Tribotester

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Cited by 6 publications
(7 citation statements)
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“…The decrease in hardness and density of a DLC film with an increase in the N content in the film was similar to the results of a previous study. 13) It was considered that the increase in the number of graphite structures was a result of the N content being increased. 13,16) The increase in the number of graphite structures in the films, as the N content increased, caused a decrease in the film density, and the nanoindentation hardness decreased as well.…”
Section: Resultsmentioning
confidence: 99%
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“…The decrease in hardness and density of a DLC film with an increase in the N content in the film was similar to the results of a previous study. 13) It was considered that the increase in the number of graphite structures was a result of the N content being increased. 13,16) The increase in the number of graphite structures in the films, as the N content increased, caused a decrease in the film density, and the nanoindentation hardness decreased as well.…”
Section: Resultsmentioning
confidence: 99%
“…13) It was considered that the increase in the number of graphite structures was a result of the N content being increased. 13,16) The increase in the number of graphite structures in the films, as the N content increased, caused a decrease in the film density, and the nanoindentation hardness decreased as well. In the comparison of N-DLC and carbon nitride (CN x ) films with the same N content of about 4%, the nanoindentation hardness of the N-DLC film prepared by the T-FAD method was 27 GPa and that of the CN x film prepared by the ion-beam-assisted mixing deposition (IBAD) method was 21 GPa.…”
Section: Resultsmentioning
confidence: 99%
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“…Harder N-DLC films in the N-DLC films have been prepared by filtered arc deposition (FAD) methods. 3,[18][19][20][21][22][23][24][25][26] The FAD methods are vacuum arc deposition (VAD) methods equipping a filtering duct for removing fine particles called a droplet generated from a cathode. 3,18) In the VAD method, an arc spot that is active at high temperature is formed on a cathode, and the cathode material evaporates.…”
Section: Introductionmentioning
confidence: 99%