In this study, thermolysis of poly(phthalaldehyde), pPHA, was investigated, and the nonvolatile residues produced were characterized by bulk and surface analyses to provide insight into its use as a resist material for thermal scanning probe lithography. A temperature of 300°C for a short time was required to remove nearly all of the residue produced from pPHA depolymerization. X‐ray photoelectron spectroscopy (XPS) was used to quantify the trace amount of hydrocarbon residue after thermolysis. Time‐of‐flight secondary ion mass spectrometry (SIMS) results show that the residue is largely PHA monomers and oligomers, but also include hydrocarbon char. Differences in molecular weight and composition of the residue as a function of copolymer composition were investigated to give insight into designing new thermal resist materials.