Tris(trimethylsilyl)silyl versus tris(trimethylsilyl)germyl: Radical reactivity and oxidation ability

New Initiating Systems for Thermal Cationic Polymerization at Ambient Temperature with in situ Formation of Ag(0) Nanoparticles: A Silane/Silver Salt Combination

“…Such a process was already reported in Ref. [18,19] The mechanism (Scheme 2) involves the TTMSS/ O 2 interaction, the formation of a silyl radical, its oxidation into a peroxyl, a rearrangement of the peroxyl (as already observed elsewhere), [19] and the further regeneration of a silyl radical together with the formation of TMS-SiH(O-TMS) 2 .…”

Visible light sensitive photoinitiating systems: Recent progress in cationic and radical photopolymerization reactions under soft conditions

“…The photochemical mechanism investigation revealed a very important triplet cleavage process (a singlet cleavage should likely contribute), the efficiency of this kind of PIs being associated with their strong absorption, the high reactivity of their excited states and the stabilization of the germyl radicals [108]. In addition to the application in photoinitiators, the germanes can also be used as efficient additives (e.g., co-initiators when incorporated with a PI) in radical and cationic photopolymerizations (see Table 1) [95,[109][110][111].…”

“…However, photopolymerization reactions under low intensity visible light irradiation conditions were rather rare and challenging before 2011. As some reviews regarding PISs have been published [1][2][3]5,7,8,18,25,[95][96][97][98][99][100], this review mainly describes the development of new PISs applicable to visible lights in the period of 2011 to early 2014 and is also an opportunity to gather the relative performance of the PISs we have recently designed, in order to propose a "one pot" comparison to the readers. Photoinitiator catalysts [19] and photosensitive systems in controlled polymerization reactions [20][21][22][23][24] have been reviewed recently and will be considered in Section 6.…”

N-Vinylcarbazole: As an Additive for Thermal Polymerization at Room Temperature with in situ Formation of Ag(0) Nanoparticules

“…The mechanism (Scheme 4) involves the oxidation of the silyl radical into a peroxyl, a rearrangement of the peroxyl (as already observed elsewhere) [63] and the further re-generation of a silyl radical together with the formation of R-SiH(O-R)2. Such a process was already reported in [63,64].…”