2015
DOI: 10.1016/j.cap.2015.03.009
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Tunable threshold voltage in solution-processed single-walled carbon nanotube thin-film transistors

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Cited by 10 publications
(9 citation statements)
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“…There are three primary sources of resistance in SWNT devices (Figure a): charge injection from the contacts into the semiconductor ( R C ), , the resistance of the s-SWNT ( R SWNT ), and the resistance of the junctions between SWNT in the channel ( R J ). ,, All three of these resistance values are affected by the band gap of the SWNTs. As the band gap of the SWNT decreases, the valence band moves to higher energies, favoring injection of holes from the source and drain electrodes and reducing R C .…”
Section: Resultsmentioning
confidence: 99%
“…There are three primary sources of resistance in SWNT devices (Figure a): charge injection from the contacts into the semiconductor ( R C ), , the resistance of the s-SWNT ( R SWNT ), and the resistance of the junctions between SWNT in the channel ( R J ). ,, All three of these resistance values are affected by the band gap of the SWNTs. As the band gap of the SWNT decreases, the valence band moves to higher energies, favoring injection of holes from the source and drain electrodes and reducing R C .…”
Section: Resultsmentioning
confidence: 99%
“…As a result, the high and thick SB disturbs the carrier transport at the interface between the SDC and Ag-MAC, leading to lower I on and mobility. We also extracted the channel sheet resistance (R s ) and contact resistance between the S/D and channel (R c ) of the SPM-TFT and Ag-MAC-TFT with the Y-method 58,59 to verify the SB height difference (Figure S5). Unlike R c , which is similar for SPM-TFT and Ag-MAC-TFT, the R s of the SPM-TFT is approximately seven times smaller than that of the Ag-MAC-TFT, which can be attributed to the SB height difference between S-CNT/M-CNT and S-CNT/Ag.…”
Section: ■ Results and Discussionmentioning
confidence: 99%
“…To further explain the I on of the three devices, we investigated the channel resistance ( R CH ) independent of the contact resistance calculated by a Y -function method. The Y -function method defined with I DS and g m is useful for extracting the mobility, V TH , R CH , and contact resistance between S/D and the active layer. , The Y value and the slope of Y can be acquired, as shown in eqs and . The R CH can be calculated by the mobility extracted from the Y method as shown in eq to exclude the contact resistance. Figure c shows R CH as a function of ρ HDC . As ρ CNT increased, R CH decreased, inducing high I on .…”
Section: Resultsmentioning
confidence: 99%
“…The Y-function method defined with I DS and g m is useful for extracting the mobility, V TH , R CH , and contact resistance between S/D and the active layer. 29,30 The Y value and the slope of Y can be acquired, as shown in eqs 1 and 2.…”
Section: ■ Results and Discussionmentioning
confidence: 99%