“…Among them, tungsten trioxide (WO 3 ) is used in many electronic devices because of its tunable properties of chemical composition, surface morphological, optical absorption in visible range and high the rmalstability 6,7 . Several preparation techniques have been used to deposit tungsten oxide thin films, including sol-gel, spray pyrolysis, chemical vapour deposition, RF sputtering, plasma evaporation, electrodeposition, etc [8][9][10][11][12][13][14][15][16][17][18] . In fact, spray pyrolysis is one of the most versatile techniques to deposit oxide films, allowing the control of many properties of the films by changing the preparation parameters of the technique.…”