2018
DOI: 10.1016/j.ceramint.2017.12.230
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Tuning magnetic properties of BiFeO3 thin films by controlling Mn doping concentration

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Cited by 42 publications
(18 citation statements)
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“…According to group theory, BFO displays 13 optical-phonon active modes (4A 1 + 9E) with space group R3c [ 22 , 23 ]. The 4 modes at 149.6, 170.0, 217.6 and 436.1 cm −1 can be designated as A 1 –symmetry longitudinal optical modes [A 1 -1, A 1 -2, A 1 -3, A 1 -4 (LO)], and 8 modes at 77.0, 265.6, 318.7, 345.4, 369.2, 482.3, 515.6 and 617.8 cm −1 are associated with transverse optical E(TO) (E-1, E-2, E-3, E-5, E-6, E-7, E-8, E-9 (TO)) phonons [ 24 , 25 ]. In this work, the E-8 mode of BFO thin film overlaps with the Raman vibration mode of silicon substrate.…”
Section: Resultsmentioning
confidence: 99%
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“…According to group theory, BFO displays 13 optical-phonon active modes (4A 1 + 9E) with space group R3c [ 22 , 23 ]. The 4 modes at 149.6, 170.0, 217.6 and 436.1 cm −1 can be designated as A 1 –symmetry longitudinal optical modes [A 1 -1, A 1 -2, A 1 -3, A 1 -4 (LO)], and 8 modes at 77.0, 265.6, 318.7, 345.4, 369.2, 482.3, 515.6 and 617.8 cm −1 are associated with transverse optical E(TO) (E-1, E-2, E-3, E-5, E-6, E-7, E-8, E-9 (TO)) phonons [ 24 , 25 ]. In this work, the E-8 mode of BFO thin film overlaps with the Raman vibration mode of silicon substrate.…”
Section: Resultsmentioning
confidence: 99%
“…In this work, the E-8 mode of BFO thin film overlaps with the Raman vibration mode of silicon substrate. The results of first-principles calculation have revealed that the Bi-O vibrations only participate in the low-frequency region of the A 1 modes and the Fe–O vibrations mainly participate in the high-frequency region of the E modes [ 24 , 25 , 26 , 27 ]. Compared with that of pure BFO, the peak positions of Raman spectra of BFCxO are slightly red-shifted, and the intensity decreases as Co doping concentration increases.…”
Section: Resultsmentioning
confidence: 99%
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“…To achieve desired functionalities, magnetic thin films must be fabricated with precise and controllable properties such as coercive field (H c ), saturation magnetisation (M s ) and the magnetization reversal profile of the hysteresis loop. Various commonly used control methods of these parameters are doping [21], the use of suitable substrates [22] and seed layers [23] and thermal annealing [24] during and post deposition. A highly influential control mechanism of magnetism in thin films is also the actual process of thin film coating, together with the choice of deposition parameters.…”
Section: Introductionmentioning
confidence: 99%