1982
DOI: 10.1016/0040-6090(82)90494-1
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Tunneling barrier structure of and thin film Josephson junctions studied by Auger electron spectroscopy and X-ray photoelectron spectroscopy analysis

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Cited by 13 publications
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“…In this case, however, technological problems related to deposition of continuous, ~10 nm thick, films from metals with low fusion temperature require solution. It is noteworthy that such alloys were used years ago in the first generation Josephson junctions (Lacquaniti et al, 1982). V or Ta could be interesting alternatives, but the best candidate for the realization of stable and robust turnstiles should obviously be Nb.…”
Section: Discussionmentioning
confidence: 99%
“…In this case, however, technological problems related to deposition of continuous, ~10 nm thick, films from metals with low fusion temperature require solution. It is noteworthy that such alloys were used years ago in the first generation Josephson junctions (Lacquaniti et al, 1982). V or Ta could be interesting alternatives, but the best candidate for the realization of stable and robust turnstiles should obviously be Nb.…”
Section: Discussionmentioning
confidence: 99%