2020
DOI: 10.1063/5.0008709
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Tunneling between density-of-state tails: Theory and effect on Esaki diodes

Abstract: Tunneling between density-of-state tails: Theory and effect on Esaki diodes

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Cited by 8 publications
(3 citation statements)
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“…However, those two-terminal NDR diodes have two primary features hindering their applications: (i) The peak-to-valley current ratio (PVCR) is rather low in tunnel diodes that are compatible with CMOS technology. In these diodes, the PVCR is usually less than 10, not high enough for memory applications (tunnel SRAM). (ii) The III–V semiconductors that produce high PVCR values (between 5 and 144) are not compatible with the current CMOS technology. , The low PVCR values in two-terminal NDR tunnel diodes have been attributed to the band-tail tunneling, which originates from the strong doping and doping fluctuations and has been studied in detail by many authors using different approaches. Many research contributions have been reported to improve the PVCR value over 100 based on a CMOS-compatible process. Extremely high, by 2–3 orders of magnitude, PVCR values have been obtained in NDR circuits based on a combination of a Si-based CMOS and a SiGe heterojunction bipolar transistor. Despite their high PVCR values, such devices possess complex circuit topology with at least three (four) transistors for a Λ-type (N-type) NDR effect (Figure ), which makes them unsuitable for memory applications …”
Section: Introductionmentioning
confidence: 99%
“…However, those two-terminal NDR diodes have two primary features hindering their applications: (i) The peak-to-valley current ratio (PVCR) is rather low in tunnel diodes that are compatible with CMOS technology. In these diodes, the PVCR is usually less than 10, not high enough for memory applications (tunnel SRAM). (ii) The III–V semiconductors that produce high PVCR values (between 5 and 144) are not compatible with the current CMOS technology. , The low PVCR values in two-terminal NDR tunnel diodes have been attributed to the band-tail tunneling, which originates from the strong doping and doping fluctuations and has been studied in detail by many authors using different approaches. Many research contributions have been reported to improve the PVCR value over 100 based on a CMOS-compatible process. Extremely high, by 2–3 orders of magnitude, PVCR values have been obtained in NDR circuits based on a combination of a Si-based CMOS and a SiGe heterojunction bipolar transistor. Despite their high PVCR values, such devices possess complex circuit topology with at least three (four) transistors for a Λ-type (N-type) NDR effect (Figure ), which makes them unsuitable for memory applications …”
Section: Introductionmentioning
confidence: 99%
“…Detrapping of these charged states at a later time is the cause of secondary pulses in the current waveform (after pulsing) that are erroneously interpreted as photon counts [1,3]. On the other hand, in Esaki diodes, recombination induced by defect states is one of the main contributors to the degradation of the peak-to-valley current ratio in the forward bias regime [4,5].…”
Section: Introductionmentioning
confidence: 99%
“…The previous reports clarified the effect of tunneling via traps on the current characteristics of a TFET or Esaki diode using a similar method. 21,22) These reports discussed the tunneling via traps, which form the tail states near the band-edge. This study aims to construct a tunneling transport model based on a relatively simple method compared with those used in previous works and clarify why the Coulomb blockade is observed experimentally only in short-channel TFETs.…”
mentioning
confidence: 99%