Two-Color Single-Photon Photoinitiation and Photoinhibition for Subdiffraction Photolithography

Scott, Timothy F.; Kowalski, Benjamin A.; Sullivan, Amy C.; Bowman, Christopher N.; McLeod, Robert R.

doi:10.1126/science.1167610

Cited by 371 publications

(327 citation statements)

References 16 publications

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“…Hence, with the increase in Kerr field intensity the separation between the states |+ ′ and |− ′ increases. Such modulation in probe absorption due to competition between transparency and absorption, induced by control and Kerr fields, can exactly mimic the behaviour shown by photopolymers and photochromic molecules used in photolithography experiments [25,26]. Therefore, an N -level system which displays both EIT and DDR effects can have a potential application in optical lithography, image processing, etc.…”

Section: A Homogeneous Field Effects On Linear Susceptibilitymentioning

confidence: 99%

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Kerr-field-induced tunable optical atomic waveguide

Sharma

Dey

2017

Phys. Rev. A

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We propose an efficient scheme for the generation of tunable optical waveguide based on atomic vapor in N -type configuration. We exploit both control field induced transparency and Kerr field induced absorption to produce a flexible probe transparency window otherwise not feasible. We employ a suitable spatial profile of control and Kerr beams to create a high contrast refractive index modulation that holds the key to guiding a weak narrow probe beam. Further we numerically demonstrate that high contrast tunable waveguide permits the propagation of different modes of probe beam to several Rayleigh lengths without diffraction. This efficient guiding of narrow optical beam may have important applications in large density image processing, and high resolution imaging.

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Section: A Homogeneous Field Effects On Linear Susceptibilitymentioning

confidence: 99%

“…The main motivation for the present study derives from recent elegant experiments on photolithography by Scott et al [25] and Andrew et al [26]. In this experiments, they used photochromic molecules as a mask to imprint a nanoscale pattern on a target material.…”

Section: Introductionmentioning

confidence: 99%

Kerr-field-induced tunable optical atomic waveguide

Sharma

Dey

2017

Phys. Rev. A

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“…The second photon reduces the polymerization rate, resulting in the delay of the gelation of bifunctional monomer. 291 In this way, spatial control over the polymerization was achieved, and structures with desired feature size and monomer conversions were formed which are not attainable with use of single-and two-photon absorption photopolymerization. A similar approach was reported, where multiphoton absorption of pulsed 800 nm light was used to initiate cross-linking in a polymer photoresist and one-photon absorption of continuous-wave 800 nm light was used to deactivate the photopolymerization simultaneously.…”

Section: New and Emerging Applicationsmentioning

confidence: 99%

Photoinitiated Polymerization: Advances, Challenges, and Opportunities

2010

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The use of photoinitiated polymerization is continuously growing in industry as reflected by the large number of applications in not only conventional areas such as coatings, inks, and adhesives but also high-tech domains, optoelectronics, laser imaging, stereolithography, and nanotechnology. In this Perspective, the latest developments in photoinitiating systems for free radical and cationic polymerizations are presented. The potential use of photochemical methods for step-growth polymerization is also highlighted. The goal is, furthermore, to show approaches to overcome problems associated with the efficiency, wavelength flexibility, and environmental and safety issues in all photoinitiating systems for different modes of activation. Much progress has been made in the past 10 years in the preparation of complex and nanostructured macromolecules by using photoinitiated polymerizations. Thus, the new and emerging applications of photoinitiated polymerizations in the field of biomaterials, surface modification, preparation of block and graft copolymers, and nanocomposites have been addressed.

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“…However, the diffraction nature of light prevents us from achieving sub-diffraction or nanometre resolution in an OBL system 5 . Even for two-beam OBL based on the polymerization and photoinhibition strategy [6][7][8][9][10] , it has been impossible to realize the fabrication with feature size and resolution comparable to that achievable by EBL due to the lack of photoresins with large two-photon absorption cross-section, high mechanical strength and sufficient photoinhibition function.…”

mentioning

confidence: 99%

Three-dimensional deep sub-diffraction optical beam lithography with 9 nm feature size

et al. 2013

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The current nanofabrication techniques including electron beam lithography provide fabrication resolution in the nanometre range. The major limitation of these techniques is their incapability of arbitrary three-dimensional nanofabrication. This has stimulated the rapid development of far-field three-dimensional optical beam lithography where a laser beam is focused for maskless direct writing. However, the diffraction nature of light is a barrier for achieving nanometre feature and resolution in optical beam lithography. Here we report on three-dimensional optical beam lithography with 9 nm feature size and 52 nm two-line resolution in a newly developed two-photon absorption resin with high mechanical strength. The revealed dependence of the feature size and the two-line resolution confirms that they can reach deep sub-diffraction scale but are limited by the mechanical strength of the new resin. Our result has paved the way towards portable three-dimensional maskless laser direct writing with resolution fully comparable to electron beam lithography.

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Two-Color Single-Photon Photoinitiation and Photoinhibition for Subdiffraction Photolithography

Cited by 371 publications

References 16 publications

Kerr-field-induced tunable optical atomic waveguide

Kerr-field-induced tunable optical atomic waveguide

Photoinitiated Polymerization: Advances, Challenges, and Opportunities

Three-dimensional deep sub-diffraction optical beam lithography with 9 nm feature size

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