2017
DOI: 10.1088/2053-1583/aa6b17
|View full text |Cite
|
Sign up to set email alerts
|

Two-dimensional MoS2 under ion irradiation: from controlled defect production to electronic structure engineering

Abstract: Two-dimensional (2D) transition metal dichalcogenides (TMDs), like MoS2, have unique electronic and optical properties, which can further be tuned using ion bombardment and post-synthesis ion-beam mediated methods combined with exposure of the irradiated sample to precursor gases. The optimization of these techniques requires a complete understanding of the response of 2D TMDs to ion irradiation, which is affected by the reduced dimensionality of the system. By combining analytical potential molecular dynamics… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1

Citation Types

8
173
1
1

Year Published

2017
2017
2024
2024

Publication Types

Select...
7

Relationship

0
7

Authors

Journals

citations
Cited by 161 publications
(183 citation statements)
references
References 70 publications
8
173
1
1
Order By: Relevance
“…Many studies have focused on modulating the carrier type and density in a controllable manner . Adapting ideas from Si‐based semiconductor technology, several approaches have been reported, including synthesis of mixed‐chalcogen TMD alloys, substitutional doping with other elements that contribute a different number of valence electrons (e.g., replacing Mo by Re, Nb, or Zr), thermal diffusion or implantation of foreign atoms, and plasma etching . However, unwanted side‐effects may generate defects in the crystalline lattice of the sub‐nanometer thick films .…”
mentioning
confidence: 99%
“…Many studies have focused on modulating the carrier type and density in a controllable manner . Adapting ideas from Si‐based semiconductor technology, several approaches have been reported, including synthesis of mixed‐chalcogen TMD alloys, substitutional doping with other elements that contribute a different number of valence electrons (e.g., replacing Mo by Re, Nb, or Zr), thermal diffusion or implantation of foreign atoms, and plasma etching . However, unwanted side‐effects may generate defects in the crystalline lattice of the sub‐nanometer thick films .…”
mentioning
confidence: 99%
“…Molecular dynamics simulations were also employed to study the production of defects in MoS 2 mono-layers under noble gas ion irradiation, such as He, Ne, Ar, Kr and Xe [169]. Sulfur atoms were sputtered away predominantly from the top or bottom layers by the ion irradiation, depending on the incident angle, ion type, and ion energy.…”
Section: -3mentioning
confidence: 99%
“…It is worth noting that the defect concentration in the free-standing WSe2 induced by a particular He + dose is slightly lower than the defect concentration that can be expected for material exposed on a bulk substrate. This is because the primary He + beam energy has a small interaction cross-section with the freestanding WSe2 [28] and back-scattered He + and recoil atoms contribute significantly toward defect introduction. For atomically thin free-standing material, the vast majority of He + transmit or forward-scatter through the material, thus minimizing defects generated from backscattered He + .…”
Section: Figure 1bmentioning
confidence: 99%