Two-dimensional nanotriangle and nanoring arrays on silicon wafer

Abstract

Gold and tungsten were deposited on silicon wafer and/or glass substrates by using random incidence sputtering deposition and thermal vapor deposition techniques. Two-dimensional tungsten nanotriangle and gold nanoring arrays were obtained on the silicon wafer substrate and examined using scanning electron microscope and atomic force microscope analysis. The size of the equal tungsten nanotriangles is within 100 nm per side and 210 nm apart from each other. The size of gold nanorings is 220 nm diameter, 40 nm wide, 10 nm thick, and 560 nm apart from each other. No nanorings were found on the glass substrate. Mechanisms for the formation of nanoring arrays are discussed.

Electric‐Field‐Assisted Growth of Highly Uniform and Oriented Gold Nanotriangles on Conducting Glass Substrates

“…[19] Several other strategies have been employed for the fabrication of NTs on planar surfaces such as seed mediation, [12,13] sputter deposition and thermal vapor deposition. [20] But ordered assembly is still a difficult task. In this report, we present an 'electrical potential assisted' method for the synthesis of uniform equilateral gold NTs, exhibiting preferred orientation having high near infrared absorption and strong surface enhanced Raman activity.…”

Anisotropic Gold Nanoparticles: Preparation, Properties, and Applications

“…FIB produced Au nanodisks [12]. EBL and FIB techniques were also combined to prepare anisotropic AuNPs arrays of Au microholes [13], grooves, nanowire circuits [14], hexagonal arrays of Au triangles [15] and Au nanorings [16]. Mirkin's group has discovered another lithography method called on-wire lithography (OWL) [17,18], which can make gapped cylindrical structures on a solid support with gaps and segment length controlled on a length scale under 100 nm by the template-based electrochemical process ( Fig.…”

Fabrication of metal nanoring array by nanoimprint lithography (NIL) and reactive ion etching

“…For a single ring as well as a ring array over small area, focused ion beam (FIB) milling or electron beam lithography is preferred due to its high resolution and versatility [5]. The fabrication of nanoring array over large area has been previously demonstrated by nano-sphere (colloidal) lithography [6,7], which is a simple and efficient method but the ring diameter is limited to several hundred nanometers and it lacks long-range ordering that is essential for certain applications (data storage, photonic devices). Another low-cost technique capable of producing sub-100 nm rings over large area is based on templating with porous anodic aluminum oxide (AAO) membranes [8]; yet it lacks longrange ordering and the AAO membrane that supports the ring is fragile.…”