Two-photon lithography of subwavelength plasmonic microstructures in metal-polymer composite resin

Jaiswal, Arun; Rani, Sweta; Singh, Gaurav Pratap; Saxena, Sumit; Shukla, Shobha

doi:10.1016/j.matlet.2021.130642

Cited by 21 publications

(8 citation statements)

References 12 publications

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Section: Metallic Containing Materialsmentioning

confidence: 99%

“…[120,231] They recently reported that a plasmonic mesh structure using a Au precursor fabricated over a large area, and structural coloration was demonstrated for the optical applications. [237]…”

Section: Metallic Containing Materialsmentioning

confidence: 99%

“…Many groups have reported Au precursors (gold(III) chloride trihydrate) because Au is more stable and has higher conductivity than other elements. [120,[231][232][233][234][235][236][237] Shukla et al demonstrated the fabrication of periodic structures comprising Au nanoparticles generated in situ and embedded in a matrix of the negative photoresist SU-8 (Figure 3g). [120,231] They recently reported that a plasmonic mesh structure using a Au precursor fabricated over a large area, and structural coloration was demonstrated for the optical applications.…”

Section: Metallic Containing Materialsmentioning

confidence: 99%

See 2 more Smart Citations

Two‐Photon Polymerization Lithography for Optics and Photonics: Fundamentals, Materials, Technologies, and Applications

Wang

Zhang

Ladika

et al. 2023

Adv Funct Materials

113

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The rapid development of additive manufacturing has fueled a revolution in various research fields and industrial applications. Among the myriad of advanced three-dimensional printing techniques, two-photon polymerization lithography (TPL) uniquely offers a significant electron microscope (SEM) images of SMP structures before and after programming and after recovery, respectively. Reproduced under terms of the CC-BY license. [114] Copyright 2021, The Authors, published by Nature Publishing Group. b) Stiff SMPs for high-resolution reversible nanophotonics. I-II) The deformed and recovered nanopillars under optical microscope and SEM, respectively. Reproduced with permission. [115] Copyright 2022, American Chemical Society. c) Vapor-responsive photonic arrays. I-IV) Optical image of a grid array in air, in water vapors ~ 20 s, saturation with water vapors ~ 88s, and after the gas flow stopped, respectively.Reproduced under terms of the CC-BY license. [116] Copyright 2021, The Authors, published by Royal Society of Chemistry. d) SEM image of a 40-layer face-cantered-cubic photonic structure printed by SU-8. Reproduced with permission. [117] Copyright 2004, Nature Publishing Group. e) SEM image of helices with an axial pitch of 800 nm and a radius of 800 nm fabricated by the two-step absorption photoresist. Reproduced with permission. [118]

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Section: Metallic Containing Materialsmentioning

confidence: 99%

Section: Metallic Containing Materialsmentioning

confidence: 99%

Section: Metallic Containing Materialsmentioning

confidence: 99%

See 1 more Smart Citation

Two‐Photon Polymerization Lithography for Optics and Photonics: Fundamentals, Materials, Technologies, and Applications

Wang

Zhang

Ladika

et al. 2023

Adv Funct Materials

113

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“…In the past few decades, a variety of fabrication technologies, i.e. electron beam lithography [1][2][3][4] , focused ion beam lithography 5,6 and two-photon polymerization [7][8][9][10][11] , has been developed for high-quality manufacturing with resolution beyond the diffraction limit to meet the increasing demand on miniaturized and compact devices for applications in fields such as optics, optoelectronics, and microelectromechanical systems (MEMS) [12][13][14][15][16][17] . However, these techniques always require complex and expensive systems and the structuring processes are rather slow.…”

Section: Introductionmentioning

confidence: 99%

Sub-100 nm feature sizes realized by cost-effective microscope projection photolithography

Zheng

Reinhardt

Roth

2023

Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XVI

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The demand on the miniaturization of products has fostered the advancement of high-resolution fabrication technologies.Here, we demonstrate a simple and low-cost UV-LED-based lithography technique for structuring at micro-and nanoscale. The corresponding experimental setup was established with off-the-shelf components and allows for single structuring within seconds based on a standard microscope projection photolithography (MPP) process. By improving the printing quality of the structure pattern on transparent foil and employing aberration-corrected optical elements in the systems, high-quality waveguides and gratings at the micro-and nanoscale were successfully fabricated. Especially, minimum feature sizes down to 80 nm using a 100x microscope objective with NA of 1.4 were obtained. This operation-friendly, highly efficient and low-cost approach exhibits great potential in micro-and nanomanufacturing for applications in fields such as nanophotonics, integrated photonics, and micro-and nanoelectromechanical systems.

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“…The demand on miniaturization and compactness of optical and electronic devices has driven the development of manufacturing technologies for high-resolution structuring at micro-and nanoscales. Electron beam lithography [1][2][3] (EBL), focused ion beam lithography [4][5][6] (IBL) and two-photon polymerization [7][8][9] (2PP) are advanced fabrication technologies enabling both 2D and 3D structuring (e.g. waveguides 10,11 , gratings [12][13][14] , photonic crystals 15 etc.)…”

Section: Introductionmentioning

confidence: 99%

Integration of UV-nanoimprint lithography with two-photon polymerization for scalable production

Zheng

Günther

Caspary

et al. 2023

Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XVI

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In this work, we demonstrate a fabrication strategy for micro-and nanooptical structures by integrating UV-nanoimprint lithography (NIL) towards two-photon polymerization (2PP) for cost-effective scalable production. Herein, 2PP was first employed to create the structures. These were then used as master molds for the subsequent UV-NIL process for highthroughput replication. With this fabrication strategy, various structures with dimensions from sub-micrometer to centimeter scales were produced and replicated. High-quality UV imprinting of the 2PP-produced master sample can be realized. The demonstrated fabrication strategy exhibits great potential for applications in scalable production of optical and optoelectronic devices or systems.

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Two-photon lithography of subwavelength plasmonic microstructures in metal-polymer composite resin

Cited by 21 publications

References 12 publications

Two‐Photon Polymerization Lithography for Optics and Photonics: Fundamentals, Materials, Technologies, and Applications

Two‐Photon Polymerization Lithography for Optics and Photonics: Fundamentals, Materials, Technologies, and Applications

Sub-100 nm feature sizes realized by cost-effective microscope projection photolithography

Integration of UV-nanoimprint lithography with two-photon polymerization for scalable production

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