2015
DOI: 10.1039/c5cc02837j
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Two step growth phenomena of molybdenum disulfide–tungsten disulfide heterostructures

Abstract: Here, we report the first demonstration of atomically thin vertically stacked MoS2/WS2 heterostructures, achieved via a two-step chemical vapour deposition (CVD) growth process. Highly ordered stacking of heterostructure domains and patterned defects have been observed. Computations based on first principles have been performed to understand observed enhanced photoluminescence of the heterostructure.

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Cited by 21 publications
(11 citation statements)
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“…Chalcogenation of TM precursor films can provide scalability and patternability of the resulting vertical heterostructures. [171,172,180] Through a two-step individual chalcogenation process, Xue et al obtained periodic arrays of MoS 2 /WS 2 vertical heterostructures by preventing the phase mixing of TMDs effectively in an unpredicted manner. [172]…”
Section: Tmd/tmd Heterostructures Have Attracted Much Attention Because the Stacking Of Differentmentioning
confidence: 99%
“…Chalcogenation of TM precursor films can provide scalability and patternability of the resulting vertical heterostructures. [171,172,180] Through a two-step individual chalcogenation process, Xue et al obtained periodic arrays of MoS 2 /WS 2 vertical heterostructures by preventing the phase mixing of TMDs effectively in an unpredicted manner. [172]…”
Section: Tmd/tmd Heterostructures Have Attracted Much Attention Because the Stacking Of Differentmentioning
confidence: 99%
“…There have been many attempts to produce MoS2-based vertical heterostructures via two-step CVD processes, in which two or more materials are grown on a substrate step by step. The first demonstrations of atomically-thin vertically-stacked MoS2/WS2 heterostructures were achieved by deposition and sulfurization methods with atomically sharp interfaces [69][70][71]. Until the in-situ vdW epitaxial growth of one type of TMDs on another has been extensively developed, further study on the interlayer coupling in the epitaxially-grown bilayer TMD heterostructure is highly promoted.…”
Section: Epitaxial Growth Of Mos 2 -Based Tmd Heterostructuresmentioning
confidence: 99%
“…[124] For the growth of WSe , by many other groups via different CVD methods. [126][127][128][129][130][131][132][133][134][135][136][137][138] As an interesting example, Palacios, Kong and co-workers recently reported a general CVD method to grow several kinds of lateral heteronanostructures, including low lattice-mismatched WS 2 -MoS 2 and large lattice-mismatched graphene-MoS 2 and hexagonal boron nitride (h-BN)-MoS 2 , by using aromatic molecules as seeds to facilitate the selective growth of 2D nanosheet on the substrate or on another pre-deposited 2D nanosheet. [139] It is noted that all the aforementioned TMD lateral heteronanostructures have an alloy-like structure at the interface regions.…”
Section: D Metal Chalcogenide Heteronanostructuresmentioning
confidence: 99%