2000
DOI: 10.1016/s0022-0248(99)00433-9
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Two-step method to grow InAs epilayer on GaAs substrate using a new prelayer

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Cited by 10 publications
(5 citation statements)
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“…However, because InSb QDs need to be grown within an InAs matrix, to deposit these QDs on GaAs substrates one must first accommodate the large lattice mismatch between InAs and GaAs ( a/a 0 = 7.2%). Depending on the growth conditions, during the initial stages of InAs deposition on GaAs either self-assembled islands or 2D films can be formed [11,12]. Experimental work has shown that during MBE growth the strain becomes fully relaxed after 7 nm of InAs has been deposited under indium rich conditions [13].…”
Section: Introductionmentioning
confidence: 99%
“…However, because InSb QDs need to be grown within an InAs matrix, to deposit these QDs on GaAs substrates one must first accommodate the large lattice mismatch between InAs and GaAs ( a/a 0 = 7.2%). Depending on the growth conditions, during the initial stages of InAs deposition on GaAs either self-assembled islands or 2D films can be formed [11,12]. Experimental work has shown that during MBE growth the strain becomes fully relaxed after 7 nm of InAs has been deposited under indium rich conditions [13].…”
Section: Introductionmentioning
confidence: 99%
“…To overcome such problems, several technical methods were suggested. A two step method using InAs prelayer grown under In rich environment [4], or a graded buffer layer (InGaAs, InAlAs, GaInAlAs) [5,6], or a Te covered GaAs surface [7], have showed a clear improvement of the physical properties of active InAs layer. Substrate orientation and growth parameters were found to change the energy of surface reconstructions, the kinetics of adsorption, migration and desorption of adatoms [8][9][10][11][12].…”
Section: Introductionmentioning
confidence: 99%
“…Moreover, the closely spaced 60 dislocation pairs may not vanish even by surface treatment 12 or post-annealing. 13 However, also exhibiting a large mismatch, InAs has been shown to behave differently upon growth on GaAs or GaP: both coherent strain (misfit dislocation free) 14,15 and plastic relaxation 16,17 have been reported. Therefore, in the high mismatched systems, the configurations and formation mechanisms of the interface misfit dislocations are complex and may need further investigation.…”
Section: Introductionmentioning
confidence: 99%