The impact of post growth annealing on the electrical properties of a long wavelength infrared type-II superlattice (SL) was explored. Quarters of a single SL wafer were annealed at 440 °C, 480 °C, and 515 °C, respectively for 30 min. Changes in the electrical properties were followed using spectral photoconductivity, temperature dependent Hall effect, and time-resolved pump-probe measurements. The bandgap energy remained at ∼107 meV for each anneal, and the photoresponse spectra showed a 25% improvement. The carrier lifetime increased from 12 to ∼15 ns with annealing. The electron mobility was nearly constant for the 440 °C and 480 °C anneals, and increased from ∼4500 to 6300 cm2/Vs for the 515 °C anneal.