1991
DOI: 10.1002/cber.19911241105
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Über die verbesserte Darstellung von Silyl‐ und Germylkalium sowie die Synthese von Silylgermanen

Abstract: An Improved Preparation of Silyl‐ and Germylpotassium and Synthesis of Silylgermanes The preparation of KSiH3 and KGeH3 is improved, and several syntheses of silylgermane, H3Si – GeH3, are described. A series of other potential processing gases for PE‐CVD is prepared: H3Ge – SiR1R2R3 (R1, R2, R3 = H, H, Me; H, H, Et; H, H, tBu; H, H, Ph; H, Me, Me; Et, Et, Et; H, Me, Ph; H, Me, GeH3). A new method for the preparation of silylgermanes by the reaction of silyl esters of sulfonic acids (RSO3H, R = C4,F9, Me, Ph) … Show more

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Cited by 22 publications
(12 citation statements)
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“…Oligosilanes are precursors in the chemical vapor deposition (CVD) of amorphous Si‐based materials for use in thin‐film solar cells. The spectrum of absorbed light can be widened to shorter or longer wavelengths through the incorporation of C or Ge atoms, respectively . Yet, the simultaneous deposition of individual silanes and germanes suffers from separation effects, which lead to Si‐ and Ge‐enriched areas and thereby reduce the photovoltaic efficiency of the device.…”
Section: Figurementioning
confidence: 99%
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“…Oligosilanes are precursors in the chemical vapor deposition (CVD) of amorphous Si‐based materials for use in thin‐film solar cells. The spectrum of absorbed light can be widened to shorter or longer wavelengths through the incorporation of C or Ge atoms, respectively . Yet, the simultaneous deposition of individual silanes and germanes suffers from separation effects, which lead to Si‐ and Ge‐enriched areas and thereby reduce the photovoltaic efficiency of the device.…”
Section: Figurementioning
confidence: 99%
“…[27] Differences in the bond orders between the CÀSi bond and the (Si/Ge)ÀSi bonds of [1] À -[3] À also become evident from the resonances of the SiCl 3 moieties in the 29 Si NMR:[ 1] À resonates at d( 29 Si) = À10.9 ppm, whereas the signals of [2] À and [3] À are detected at lower field strengthsw ith almost identical chemicals hiftv alues of d( 29 Si) = 29.5 and 29.7 ppm, respectively.I nt he case of [1·GaCl 3 ] À versus [1] À ,t he SiCl 3 resonance undergoes ad ownfield shift to d( 29 Si) = À3.4 ppm (cf. H [1]: À2.6 ppm). [18] The resonances of the other two adducts experi- [19] and 11.3 ppm ([3·GaCl 3 ] À ).…”
mentioning
confidence: 97%
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“…Sundermeyer et al synthesized the silylgermanes (H 3 Si) 2 GeH 2 , (H 3 Si) 3 GeH, and (H 3 Si) 4 Ge from the corresponding silylgermanides (H 3 Si) x GeH 4– x Na ( x = 2–4) and C 4 F 9 SO 3 SiH 3 and isolated the individual products by preparative gas chromatography . The same group presented an alternative approach to H 3 GeSiH 3 by halodephenylation of H 3 GeSiH 2 Ph with anhydrous HBr followed by hydrogenation of the bromosilane intermediate with LiAlH 4 . Hoefler et al, finally, investigated the reaction of Ph 3 GeSiPh 3 with excess anhydrous HCl or HBr and observed the predominant scission of the Si–Ge bond .…”
Section: Introductionmentioning
confidence: 99%