UHV Cantilever Beam Technique for Quantitative Measurements of Magnetization, Magnetostriction, and Intrinsic Stress of Ultrathin Magnetic Films

Weber, M.; Koch, R.; Rieder, K. H.

doi:10.1103/physrevlett.73.1166

Cited by 132 publications

(63 citation statements)

References 25 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…This is in very good agreement with the experimentally determined values. Thus we conclude that the proposed method conforms with standard magnetostriction measurement techniques, which e. g. use the bending of a cantilever covered with a thin magnetostrictive film [29][30][31][32] , and is therefore suitable to quantitatively determine the magnetostriction constants of thin films. In contrast to cantilever-based experiments, where magnetostriction causes a bending of the mechanical element, the present approach uses a pre-stressed, doubly-clamped nanobeam where the magnetostrictive stress modifies the total stress along the beam axis and therefore changes the resonance frequency of the beam.…”

supporting

confidence: 61%

A versatile platform for magnetostriction measurements in thin films

Pernpeintner

Holländer

Seitner

et al. 2016

Journal of Applied Physics

View full text Add to dashboard Cite

We present a universal nanomechanical sensing platform for the investigation of magnetostriction in thin films. It is based on a doubly-clamped silicon nitride nanobeam resonator covered with a thin magnetostrictive film. Changing the magnetization direction within the film plane by an applied magnetic field generates a magnetostrictive stress and thus changes the resonance frequency of the nanobeam. A measurement of the resulting resonance frequency shift, e. g. by optical interferometry, allows to quantitatively determine the magnetostriction constants of the thin film. We use this method to determine the magnetostriction constants of a 10 nm thick polycrystalline cobalt film, showing very good agreement with literature values. The presented technique can be useful in particular for the precise measurement of magnetostriction in a variety of (conducting and insulating) thin films, which can be deposited by e. g. electron beam deposition, thermal evaporation or sputtering.Keywords: nanomechanics; magnetostriction; NEMS; thin films Nanomechanical systems are an established platform for mass and force detection. In particular, the high quality factors of their vibrational modes 1 make them ideally suited for high-precision sensing applications in (nano)biology, medicine, chemistry and physics 2-6 . For example, nanomechanical resonators allow for the detection of DNA molecules 7 and atoms 8 , and nanomechanical resonance spectroscopy has been proposed as a versatile tool and extension of conventional spectroscopy techniques in biology and chemistry 9 . In solid state physics, nanomechanical sensors are utilized for the investigation of material properties of thin films 10-12 , which often significantly differ from those of bulk materials 13,14 . One particular aspect is the investigation of externally tunable material properties as discussed in the field of multiferroics 15 . For example, it has been demonstrated that magnetostriction and magnetic anisotropy in a Ga 0.948 Mn 0.052 As thin film can precisely be investigated using a nanomechanical beam setup 16 .Here, we extend this concept and present a universal platform for the experimental investigation of magnetostrictive thin films which uses a doubly-clamped silicon nitride (Si 3 N 4 ) nanobeam covered with a thin layer of the material of interest. This approach allows for the investigation of any magnetostrictive thin film materialconducting as well as insulating-which can be deposited on a Si 3 N 4 nanobeam, using e. g. electron beam evapoa) Electronic mail: matthias.pernpeintner@wmi.badw.de b) Electronic mail: huebl@wmi.badw.de ration, thermal evaporation or sputtering. As the thin film deposition is the last step in the sample fabrication process, the ferromagnetic film is not exposed to etching solution or dry etch reactants, which allows to apply this technique to a broad range of materials. Moreover, the measurement sensitivity is expected to be independent of the film thickness which could be useful for the investigation of very thin magnetostrictive...

show abstract

supporting

confidence: 61%

A versatile platform for magnetostriction measurements in thin films

Pernpeintner

Holländer

Seitner

et al. 2016

Journal of Applied Physics

View full text Add to dashboard Cite

show abstract

“…In spite of the fundamental issues related to stress during heteroepitaxial growth, experimental determinations of film stress with submonolayer sensitivity are rare. [4][5][6] In this paper we present direct experimental evidence for the intimate relation between film stress and structural transitions for the growth of Ni on W͑110͒ from the combination of low-energy electron diffraction ͑LEED͒, scanning tunneling microscopy ͑STM͒, and stress measurements. For coverages below 0.5 ML we measure considerable compressive film stress in the pseudomorphic Ni film while, based on lattice mismatch arguments, tensile stress is expected.…”

Section: Max-planck-institut Für Mikrostrukturphysik Weinberg 2 D-0mentioning

confidence: 99%

Stress and structure of Ni monolayers on W(110): The importance of lattice mismatch

et al. 1998

View full text Add to dashboard Cite

“…24 An almost constant value of the saturation magnetization M 0 ϭ1.78 MA/m ͑equal to that for bulk Fe͒ of the polycrystalline Fe films for thickness from 1000 down to 30 Å has been observed. 5 The value of the coercive field in the thickness range 30-50 Å was considerably smaller than for films that are much thicker. Theoretical consideration 25,26 shows that the 2D Heisenberg layers may have a reorientation temperature point T R , where magnetization of the monolayer rotates from out-of-plane to in-plane and the planar magnetic structure is valid above the phase transition temperature TϾT R .…”

mentioning

confidence: 93%

“…5 ͑B͒ Devices which provide high-resolution imaging of magnetic structures such as a magnetic force microscope, and magneto-optic Kerr effect device. [6][7][8] ͑C͒ Synchrotron source photon beams techniques.…”

mentioning

confidence: 99%

“…14 The decreased magnetization value observed for the 26 Å film is most likely caused by Tϭ77 K being close to the Curie point for this film thickness. Superparamagnetic behavior for Fe films at a thickness below 30 Å has been detected, 5 and it was suggested that this is a typical magnetic property for film which had formed islands during growth. The transition to in-plane ferromagnetic behavior of the magnetic structure at an average island radius aϾ30 Å ͑at about 13 ML of Fe͒ has been observed.…”

mentioning

confidence: 99%

See 1 more Smart Citation