Ultra-high color gamut system achieved by quantum dot photoresist and color filter system

Xie, Dexin; Qi, Yonglian; Zhang, Bin; Zhou, Tingting; Gao, Wenbao; Wu, Zhongyuan; Zhang, Xiqing

doi:10.1080/00150193.2018.1448627

Cited by 6 publications

(2 citation statements)

References 17 publications

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“…The current research on CPRs emphasizes their optical properties and manufacturing processes predominantly centers on their optical, process, and mechanical properties, leaving mechanical properties relatively unexplored. [2,[6][7][8][9][10][11][12][13][14][15] In products with the COA structure, CPRs cover the entire array. During the production process by factories or subsequent use by customers, the stress of CPRs will cause the entire array circuits to collapse.…”

Section: Introductionmentioning

confidence: 99%

P‐7.19: Investigation on the stress of color filter and subsequent failure behavior of COA structure

Li,

Zhang,

Liao

et al. 2024

Symp Digest of Tech Papers

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Color filter (CF) is a critical component in thin‐film transistor liquid crystal display (TFT‐LCD) products, which directly determines the optical performance of LCDs. CF was manufactured through the photolithography process. The physical and chemical properties of CF materials not only influence the image quality of displays, but also directly determine the manufactures and yields in the CF production process. Current research on CF focuses on their optical and manufacturing properties, which basically does not pay much attention to their mechanical properties. Especially in products with CF on array (COA) structure, the CF layer is above the array pattern. During the production process of photoresists, the stress of CF materials may cause a failing array circuit. In the process of developing a red photoresist, we observed dark‐dotted anomalies caused by the break of the gate insulator (GI) due to photoresist stress. Through stress analysis of different formulations, it was discovered that utilizing multifunctional reactive monomers could significantly increase material stress, resulting in an increased incidence of pixel dark spots. Combined with GI failure, the mechanism of dark spots was demonstrated. The analysis provided theoretical support and guidance for improving the production yields of COA‐structured TFT‐LCDs.

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Section: Introductionmentioning

confidence: 99%

P‐7.19: Investigation on the stress of color filter and subsequent failure behavior of COA structure

Li,

Zhang,

Liao

et al. 2024

Symp Digest of Tech Papers

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show abstract

“…[1][2][3] In these devices, the color resistance layer is critical for achieving full-color display, determining optical properties such as color gamut, transmittance, etc. [4][5][6][7] There are three main types of color resistance layers, red (R), green (G), and blue (B). A common production sequence is in the order of R, G and B, and the thickness of the B layer is generally thicker than the others.…”

Section: Introductionmentioning

confidence: 99%

P‐94: Strategies for Adjusting the Flowability of Photoresist from Aspects of Material Composition and Manufacturing Process

Feng,

Li,

Zhang

2024

Symp Digest of Tech Papers

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The flowability of the photoresist affects the flatness of the color resistance layer during the fabrication process of liquid crystal displays. Color photoresists with poor flowability will increase the usage of photoresists, leading to an increase in panel costs. In this paper, the factors affecting flowability were analyzed in the directions of material and manufacturing and the results were then validated through experiments. Finally, strategies to adjust the flowability of photoresists from aspects of material composition and manufacturing process are summarized.

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Research progress of color photoresists for TFT-LCD

Li,

Yin,

Meng

2024

Dyes and Pigments

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Ultra-high color gamut system achieved by quantum dot photoresist and color filter system

Cited by 6 publications

References 17 publications

P‐7.19: Investigation on the stress of color filter and subsequent failure behavior of COA structure

P‐7.19: Investigation on the stress of color filter and subsequent failure behavior of COA structure

P‐94: Strategies for Adjusting the Flowability of Photoresist from Aspects of Material Composition and Manufacturing Process

Research progress of color photoresists for TFT-LCD

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