Ultra-low Loss Arrayed Waveguide Grating Using Deep UV Lithography on a Generic InP Photonic Integration Platform

Bolk, Jeroen; Ambrosius, H.P.M.M.; DasMahapatra, P.; Stabile, Patty; Latkowski, Sylwester; D’Agostino, D.; Bitincka, E Elton; Augustin, LM Luc; Marsan, Didier; Voets, Rutger; Williams, Kevin

doi:10.1109/ecoc.2017.8345906

Cited by 5 publications

(3 citation statements)

References 3 publications

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“…In this work, we report for the first time on technical details of the application of ArF deep UV (DUV) lithography for the fabrication of InP-based PICs, continuing our earlier research [9]. An ASML PAS5500 /1100 tool was installed at the NanoLab@TU/e cleanroom in Eindhoven and modified to be, to our knowledge, the only scanner in the world to allow for 100 nm resolution exposures with 15 nm overlay, at high speeds on InP substrates as small as 3-inch.…”

Section: Introductionmentioning

confidence: 55%

Deep UV Lithography Process in Generic InP Integration for Arrayed Waveguide Gratings

Bolk

Ambrosius

Latkowski

et al. 2018

IEEE Photon. Technol. Lett.

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DOI to the publisher's website. • The final author version and the galley proof are versions of the publication after peer review. • The final published version features the final layout of the paper including the volume, issue and page numbers. Link to publication General rights Copyright and moral rights for the publications made accessible in the public portal are retained by the authors and/or other copyright owners and it is a condition of accessing publications that users recognise and abide by the legal requirements associated with these rights. • Users may download and print one copy of any publication from the public portal for the purpose of private study or research. • You may not further distribute the material or use it for any profit-making activity or commercial gain • You may freely distribute the URL identifying the publication in the public portal. If the publication is distributed under the terms of Article 25fa of the Dutch Copyright Act, indicated by the "Taverne" license above, please follow below link for the End User Agreement:

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Section: Introductionmentioning

confidence: 55%

Deep UV Lithography Process in Generic InP Integration for Arrayed Waveguide Gratings

Bolk

Ambrosius

Latkowski

et al. 2018

IEEE Photon. Technol. Lett.

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“…It was not possible to obtain the AWG insertion loss directly because it is embedded within the transmitter circuit. Similar AWGs fabricated in the same technology exhibit 3 dB insertion loss [29].…”

Section: Chip-level Performancementioning

confidence: 99%

A 6 × 30 Gb/s Tunable Transmitter PIC With Low RF Crosstalk From an Open-Access InP Foundry

Yao

Smalbrugge

Smit

et al. 2019

IEEE J. Select. Topics Quantum Electron.

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DOI to the publisher's website.• The final author version and the galley proof are versions of the publication after peer review.• The final published version features the final layout of the paper including the volume, issue and page numbers. Link to publication General rightsCopyright and moral rights for the publications made accessible in the public portal are retained by the authors and/or other copyright owners and it is a condition of accessing publications that users recognise and abide by the legal requirements associated with these rights.• Users may download and print one copy of any publication from the public portal for the purpose of private study or research. • You may not further distribute the material or use it for any profit-making activity or commercial gain • You may freely distribute the URL identifying the publication in the public portal.If the publication is distributed under the terms of Article 25fa of the Dutch Copyright Act, indicated by the "Taverne" license above, please follow below link for the End User Agreement:

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“…By integrating AWGs with other photonic components including semiconductor amplifiers, modulators/detectors, or switches, multi-functional integrated photonic circuits have also been demonstrated, such as, multi-wavelength lasers [7], reconfigurable optical add-drop multiplexer [8,9], microwave photonic processers [9,10], or optical computing chips [11]. High-performance AWGs have been demonstrated in various photonic integration platforms based on silica [12,13], polymer [14], InP [15], silicon [16][17][18][19],…”

Section: Introductionmentioning

confidence: 99%

Anisotropy-free arrayed waveguide gratings on X-cut thin film lithium niobate platform of in-plane anisotropy

Liu,

YI,

Guo

et al. 2024

Preprint

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Arrayed waveguide grating is a versatile and scalable integrated light dispersion device, which has been widely adopted in various applications, including, optical communications and optical sensing. Recently, thin-film lithium niobate emerges as a promising photonic integration platform, due to its ability of shrinking largely the size of typical lithium niobate based optical devices and possible integration of them on a chip. However, due to the intrinsic anisotropy of the material, to build an arrayed waveguide grating on X-cut thin-film lithium niobate has never been successful. Here, a universal strategy to design anisotropy-free dispersive components on a uniaxial in-plane anisotropic photonic integration platform is introduced for the first time. This leads to the first implementation of arrayed waveguide gratings on X-cut thin-film lithium niobate with various configurations and high-performances. The best insertion loss of 2.4dB and crosstalk of -24.1dB is obtained for the fabricated arrayed waveguide grating devices. Applications of such arrayed waveguide gratings as a wavelength router and in a wavelength-division multiplexed optical transmission system are also demonstrated.

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Ultra-low Loss Arrayed Waveguide Grating Using Deep UV Lithography on a Generic InP Photonic Integration Platform

Cited by 5 publications

References 3 publications

Deep UV Lithography Process in Generic InP Integration for Arrayed Waveguide Gratings

Deep UV Lithography Process in Generic InP Integration for Arrayed Waveguide Gratings

A 6 × 30 Gb/s Tunable Transmitter PIC With Low RF Crosstalk From an Open-Access InP Foundry

Anisotropy-free arrayed waveguide gratings on X-cut thin film lithium niobate platform of in-plane anisotropy

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