“…[2][3][4][5][6] Pt and Ti tend to have a fairly smooth diffusion profile when annealed at our maximum processing temperature of 300°C. [2][3][4] Although Pd and Au have rougher diffusion profiles, some work has indicated that if they are thin enough, they may also be used. 5 Furthermore, Pt is an excellent diffusion barrier to Au at our processing temperature of 300°C, provided it is thick enough to avoid pinholes or other defects, so Au can be used as the top metal for all of the subsequent interconnects.…”