2010
DOI: 10.1016/j.optmat.2010.07.012
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Ultra thin high index contrast photonic crystal slabs in lithium niobate

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Cited by 29 publications
(19 citation statements)
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“…The irradiation was performed at various energies: 600 keV with a fluence of 7.2·10 14 cm −2 and 350, 150, 60 keV each with a fluence of 1.38·10 14 cm −2 . The resulting defect distribution in the crystal was designed to obtain a layer of homogeneously damaged material starting from the surface down to the designed depth of 500 nm [43].…”
Section: Fabrication Process Of the Lithium Niobate Nanowaveguidesmentioning
confidence: 99%
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“…The irradiation was performed at various energies: 600 keV with a fluence of 7.2·10 14 cm −2 and 350, 150, 60 keV each with a fluence of 1.38·10 14 cm −2 . The resulting defect distribution in the crystal was designed to obtain a layer of homogeneously damaged material starting from the surface down to the designed depth of 500 nm [43].…”
Section: Fabrication Process Of the Lithium Niobate Nanowaveguidesmentioning
confidence: 99%
“…The helium-ion irradiation formed a buried damaged layer inside the crystal [46] with a thickness of 450 nm. The layer was positioned below the substrate surface and connected exactly with the damaged region created by the preceding argon-ion irradiations [43].…”
Section: Fabrication Process Of the Lithium Niobate Nanowaveguidesmentioning
confidence: 99%
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“…The PhC cavities were fabricated by focused ion beam (FIB) milling in an X-cut LN wafer previously irradiated by helium ions. 12,13 The He ion irradiation gives rise to a buried damaged layer that can be etched by hydrofluoric acid much faster than the non-irradiated part of the crystal. After this selective wet etching process, the PhC cavities lie in a 0.76a thick LN membrane suspended above the LN substrate.…”
mentioning
confidence: 99%
“…The maximum index contrast can be achieved in free-standing membranes fabricated by ion-beam enhanced etching ͑IBEE͒, with an air hole lattice being drilled either by FIB, 9 or directly by IBEE. 10,11 This last technique is advantageous owing to its potential to be scaled up to wafer size areas. Nevertheless, the optical properties of PhCs etched by IBEE have not yet been investigated experimentally.…”
mentioning
confidence: 99%