Chemical vapour deposition (CVD) is a powerful technology for producing high-quality solid thin films and coatings. While widely used in modern industries, it is continuously being developed as it is adapted to new materials. Today, CVD synthesis is being pushed to new heights with the precise manufacturing of both inorganic thin films of two-dimensional (2D) materials and high-purity polymeric thin films that can be conformally deposited on various substrates. In this Primer, an overview of the CVD technique including instrument construction, process control, material characterization, and reproducibility issues is provided. By taking graphene, 2D transition metal dichalcogenides (TMDs) and polymeric thin films as typical examples, the best practices for experimentation involving substrate pre-treatment, hightemperature growth and post-growth processes are presented. Recent advances and scaling-up challenges are also highlighted. By analyzing current limitations and optimizations, we also provide insight into possible future directions for the method, including reactor design for highthroughput and low-temperature growth of thin films.