Ultrafast internal modification of glass by selective absorption of a continuous-wave laser into excited electrons

Miyamoto, Naoyuki; Ito, Yusuke; Chen, Wei; Yoshizaki, Reina; Shibata, Akihiro; Nagasawa, Ikuo; Nagato, Keisuke; Sugita, Naohiko

doi:10.1364/ol.394952

Cited by 13 publications

(3 citation statements)

References 31 publications

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“…The double-pulse sequences with different pulse durations also showed significant effect on material removal efficiency [21]. In this point, we demonstrated a scheme of fs + ps double-pulse sequence to improve the etching rate of microchannels in fused silica.…”

Section: Introductionmentioning

confidence: 84%

Optimization of fs + ps double-pulse sequence parameters for laser-assisted chemical etching of microchannels in fused silica

Yao

Song

Yin

et al. 2023

J. Phys. D: Appl. Phys.

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Developing laser fabricating technology to improve the etching rate of microchannels is of great significance for development of microfluidic devices. In this paper, the laser processing parameters of fs+ps double-pulse sequence, including delay and pulse energy ratio, have been investigated to optimize the fabrication of microchannels, thus to obtain a high etching rate. As a result, the optimal energy ratio could be obtained at Efs : Eps=2:1 in negative delays. Furthermore, the etching rate of microchannels was significantly improved by 40.8% compared with those written by fs+fs double-pulse sequence with an energy ratio of 1:1. This improvement is possibly because fs sub-pulse excited seed electron may trigger impact ionization via an efficient energy absorption process within the following ps sub-pulse, this energy accumulation and subsequent thermal diffusion lead to an increase of the modified area. Aforementioned results possibly offer an effective route to improve the etching rate of microchannels which is in favour of accelerating the fabrication of three-dimensional microfluidic devices.

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Section: Introductionmentioning

confidence: 84%

Optimization of fs + ps double-pulse sequence parameters for laser-assisted chemical etching of microchannels in fused silica

Yao

Song

Yin

et al. 2023

J. Phys. D: Appl. Phys.

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“…Englert et al [10] further explained that the interaction between fs laser DPs and wideband dielectric materials can control the electron ionization process by simulating the free electron density, thus controlling the laser processing. The mechanism of fs laser processing is essentially determined by the laser-electron interaction and the subsequent changes in electron plasma formation and the induced filaments [11][12][13][14]. Therefore, characterizing the temporal and spatial evolution of the electron plasma during fs laser processing is conducive to understanding the interaction of the DPs with the material, allowing us to more accurately control the fs DP laser-processing materials.…”

Section: Of 11mentioning

confidence: 99%

The Spatiotemporal Dynamics of Electron Plasma in Femtosecond Laser Double Pulses Induced Damage in Fused Silica

Shen

Tian³

et al. 2023

Photonics

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In this study, we employed the fs time-resolved shadowgraphy method to investigate the impact of the first pump pulse (DP1) on the transient temporal and spatial evolution of electron plasma induced by femtosecond (fs) laser double pulses (DPs) in fused silica. It was observed that the DP1-induced phase transition acted as a waveguide, confining the propagation of the second pump pulse (DP2) light inside the material and resulting in a decrease in the diameter of the DP2-induced electron plasma region. Moreover, the DP2-induced maximum peak electron density was higher than that induced by a single pulse (SP) at the same pulse energy, which may be explained by the DP1-induced highly absorbing semi-metallic state of warm dense glass in fused silica. Importantly, as the energy of DP1 increased, the mean diameter of the DP2-induced electron plasma region further decreased, and the maximum peak electron density increased. Compared with SPs, DPs more easily produced damage in fused silica. In addition, the mean diameter of the DP2-induced electron plasma region and the maximum peak electron density remained almost unchanged when the pulses’ time separation (ts) was changed from 1 to 50 ps, mainly due to the long relaxation time of the phase transition caused by DP1.

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“…Miyamoto et al used a coaxial combination of fs laser and continuous-wave laser to explore more efficient ways to enhance the ionization process in glass. Because the characteristics of both types of lasers can be fully taken into account for material ionization, the processing speed was about 500 times higher than that of ordinal methods [16] . These studies have provided a range of evidence for double-pulse sequence irradiation improving the processing efficiency.…”

Section: Introductionmentioning

confidence: 99%

Nonlinear ionization control by temporally shaped fs+ps double-pulse sequence on ZnO

et al. 2023

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We designed a femtosecond (fs) + picosecond (ps) double-pulse sequence by using a Mach-Zehnder-like apparatus to split a single 120 fs pulse into two sub-pulses, and one of them was stretched to a width of 2 ps by a four-pass grating system. Through observing the ripples induced on the ZnO surface, we found the ionization rate appeared to be higher for the sequence in which the fs pulse arrived first. The electron rate equation was used to calculate changes of electron density distribution for the sequences with different delay times. We suggest that using a temporally shaped fs+ps pulse sequence can achieve nonlinear ionization control and influence the induced ripples.

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Ultrafast internal modification of glass by selective absorption of a continuous-wave laser into excited electrons

Cited by 13 publications

References 31 publications

Optimization of fs + ps double-pulse sequence parameters for laser-assisted chemical etching of microchannels in fused silica

Optimization of fs + ps double-pulse sequence parameters for laser-assisted chemical etching of microchannels in fused silica

The Spatiotemporal Dynamics of Electron Plasma in Femtosecond Laser Double Pulses Induced Damage in Fused Silica

Nonlinear ionization control by temporally shaped fs+ps double-pulse sequence on ZnO

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