2007
DOI: 10.1007/s00170-007-1223-5
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Ultrafast laser micromachining of 3C-SiC thin films for MEMS device fabrication

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Cited by 80 publications
(30 citation statements)
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“…According to the literature [4,12,22,[34][35][36][37], the interaction mechanism of ultrafast pulsed laser with material mainly includes common melting, ultrafast melting, thermal vaporization, coulomb explosion, phase explosion, avalanche ionization, and multiphoton ionization. However, the material removal process actually involves the combined effects of multiple mechanisms, which are difficult to distinguish clearly.…”
Section: Division Of Ablation Areamentioning
confidence: 99%
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“…According to the literature [4,12,22,[34][35][36][37], the interaction mechanism of ultrafast pulsed laser with material mainly includes common melting, ultrafast melting, thermal vaporization, coulomb explosion, phase explosion, avalanche ionization, and multiphoton ionization. However, the material removal process actually involves the combined effects of multiple mechanisms, which are difficult to distinguish clearly.…”
Section: Division Of Ablation Areamentioning
confidence: 99%
“…This value is the ablation threshold. Currently, three main methods are used to determine the material ablation threshold [4,12,22,37]. First method is morphological observation, which helps to examine the existence of permanent damage by observing the surface morphology with a microscope.…”
Section: Determination Of Ablation Thresholdmentioning
confidence: 99%
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“…So, shorter pulse duration lasers (nanoseconds to femtoseconds) are used for high precision industrial applications. Femtosecond lasers have produced little contamination and low HAZ due to short beam material interaction time [16]. However, the femtosecond laser micromachining system is costly and machining rates are low compared to nanosecond laser.…”
Section: Introductionmentioning
confidence: 99%