Ultralow-k nanoporous organosilicate dielectric films imprinted with dendritic spheres

Abstract

Integrated circuits that have improved functionality and speed in a smaller package and that consume less power are desired by the microelectronics industry as well as by end users, to increase device performance and reduce costs. The fabrication of high-performance integrated circuits requires the availability of materials with low or ultralow dielectric constant (low-k: k <OR= 2.5; ultralow-k: k <OR= 2.0) because such dielectrics not only lower line-to-line noise in interconnect conductors, but also minimize power dissipation by reducing the capacitance between the interconnects. Here we describe the preparation of low- and ultralow-k nanoporous organosilicate dielectrics from blends of polymethylsilsesquioxane (PMSSQ) precursor with globular ethyl acrylate-terminated polypropylenimine dendrimers, which act as porogens. These dendrimers are found to mix well with the PMSSQ precursor and after their sacrificial thermal decompositions result in closed, spherical pores of <2.0 nm radius with a very narrow distribution even at high loading. This pore size and distribution are the smallest and the narrowest respectively ever achieved in porous spin-on dielectrics. The method therefore successfully delivers low- and ultralow-k PMSSQ dielectric films that should prove very useful in advanced integrated circuits.

Well-defined and stable nanomicelles self-assembled from brush cyclic and tadpole copolymer amphiphiles: a versatile smart carrier platform

“…Solution X-ray scattering measurements were carried out at the 4C beamline [30][31][32] of the Pohang Accelerator Laboratory at Pohang University of Science and Technology. Each micellar solution was filtered through a disposable syringe equipped with a polytetrafluoroethylene filter with a 0.2 μm pore size before measurements.…”

Refractive Indexes of Porous Thin Films Prepared From Organic-templated Polymethylsilsesquioxanes

“…Star-shaped poly(ε-caprolactone)s (PCLs) are widely applied as pore generators (organic templates) in nanoporous material research [3][4][5][6][7][8][9][10]17]. These templates used in this work bear aliphatic ether cores, and four (or six) polyester arms.…”

“…Nanoporous silicate thin films are considered as important materials for advanced electronics. The formation of air-filled nanopores is a key technology for preparing insulating materials [3][4][5][6][7][8][9][10][11][12]. Polymethylsilsesquioxane (PMSSQ), with the empirical formula of (CH 3 -SiO 1.5 )n, is a potential candidate for low dielectric spin-on glass [13].…”

High-performance triazole-containing brush polymers via azide–alkyne click chemistry: a new functional polymer platform for electrical memory devices

“…GIXS measurements were carried out with an incident angle α i of 0.132 − 0.154°using a two-dimensional (2D) chargecoupled detector (MAR USA, Evanston, IL, USA) at the 3C beamline of the Pohang Accelerator Laboratory in accordance with the method reported in the literature. 32,33 X-ray radiation sources with a wavelength λ of 0.1117 and 0.1166 nm were used. The sample-to-detector distances were 229.0 and 233.9 mm.…”