Ultrathin film preparation of superconducting 2223 Bi(Pb)SrCaCuO by sputter deposition and rapid annealing

Abstract

The growth of superconducting Bi(Pb)SrCaCuO thin films was examined. Films with various thicknesses between 100-3000 Å were prepared on MgO(100) substrates by sputter deposition and subsequent rapid annealing. The obtained films were c-axis oriented superconducting thin films with a 2223 phase and zero resistivity at 100-105 K. The ultrathin film of thickness 200 Å showed zero resistivity at 100 K and had a critical current density (J c ) of about 8 × 10 5 A cm −2 at 77 K whilst in a zero magnetic field. This film displayed a J c of 7 × 10 5 A cm −2 at 77 K under a 1 T magnetic field applied parallel to the film surface and perpendicular to the current direction. J c decreased very slightly in a low magnetic field (0-0.1 T) and no hysteresis was observed in the J c -B curve. The film also showed little degradation of J c in magnetic fields of up to 3 T.

Critical current density enhancement of Bi, Pb-2223 thin film fabricated by RF sputtering and post-annealing processes

“…However, reports on Pb-doped BSCCO films [18,19] indicate that much of the original Pb is lost from the sample during the requisite high-temperature annealing. Pb-doped Bi-2223 thin films have been prepared by RF magnetron sputtering [20], DC magnetron sputtering [21][22][23][24], PLD [25], and CVD [26,27]. The RF sputtering and postannealing methods are useful to demonstrate the formation of Bi-2223.…”