2017
DOI: 10.1088/1361-6528/aa91bd
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Ultraviolet-assisted direct patterning and low-temperature formation of flexible ZrO2 resistive switching arrays on PET/ITO substrates

Abstract: We demonstrate a low-cost and facile photochemical solution method to prepare the ZrO resistive switching arrays as memristive units on flexible PET/ITO substrates. ZrO solution sensitive to UV light of 337 nm was synthesized using zirconium n-butyl alcohol as the precursor, and benzoylacetone as the complexing agent. After the dip-coated ZrO gel films were irradiated through a mask under the UV lamp (with wavelength of 325-365 nm) at room temperature and rinsed in ethanol, the ZrO gel arrays were obtained on … Show more

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Cited by 11 publications
(7 citation statements)
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“…Other resistive switching materials such as TiO 2 and ZrO 2 were subjected to the same post-treatment and used as resistive switching layers in flexible substrates based on PET/ITO. [174,198] Both devices presented good retention and endurance characteristics even after being bent 1000 times, which is quite promising for further flexible applications. Another advantage related to solution-based metal oxide thin films processed at low temperature is the presence of an amorphous oxide, which is highly desirable for flexible S-RRAMs, since electronic performance does not depend on the degree of films' disorder and the materials have ultrasmooth surfaces for suppressing interface traps and scattering centers.…”
Section: Flexible S-rramsmentioning
confidence: 97%
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“…Other resistive switching materials such as TiO 2 and ZrO 2 were subjected to the same post-treatment and used as resistive switching layers in flexible substrates based on PET/ITO. [174,198] Both devices presented good retention and endurance characteristics even after being bent 1000 times, which is quite promising for further flexible applications. Another advantage related to solution-based metal oxide thin films processed at low temperature is the presence of an amorphous oxide, which is highly desirable for flexible S-RRAMs, since electronic performance does not depend on the degree of films' disorder and the materials have ultrasmooth surfaces for suppressing interface traps and scattering centers.…”
Section: Flexible S-rramsmentioning
confidence: 97%
“…Various initiation sources such as furnace [219,223] or oven, [184,190,224] rapid thermal annealing (RTA), [131,140,202,204,225,226] microwave, [119,122,124,227] ultraviolet (UV) photochemical activation (lamp [118,174,198,228] and laser [229] ), and hotplate [98,185] have been used for the solution-based metal oxides films' conversion for RRAM devices. From these, the most common initiation sources are based on conventional thermal annealing (CTA), like furnace/oven and hotplate annealing.…”
Section: Thermal and Irradiation Annealing Treatment For Film Conversionmentioning
confidence: 99%
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