Unambiguous profilometry by fringe-order identification in white-light phase-shifting interferometry

Sandoz, Patrick; Devillers, Robin; Plata, Arturo

doi:10.1080/09500349708232918

Cited by 109 publications

(48 citation statements)

References 11 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Many different types of measurement techniques also used only for surface profiling. [2][3][4][5][6][7][8][9][10][11][12][13][14] Another technique using white light is spectrally resolved white light interferometry. 15 In this technique a white light interferogram is dispersed by a spectrometer and projected on a CCD camera.…”

Section: Introductionmentioning

confidence: 99%

Determination of film thickness and surface profile using reflectometry and spectrally resolved phase shifting interferometry

Debnath

You

Kim

2009

Int. J. Precis. Eng. Manuf.

View full text Add to dashboard Cite

Surface profiling and film thickness measurement play an important role for inspection in semi conductor industry. White light source had been used as scanning white light interferometry and spectrally resolved white light interferometry for determining surface and film thickness profile. These techniques however failed for thinner film. Recently, reflectometry and spectrally resolved white light interferometry was combined for the same. This technique used Fourier Transform for the calculation of phase in spectral domain with the use of Linnik interferometer. In this method a large amount of carrier offset (carrier fringes) is required to be effective. This carrier fringes in spectrally resolved white light interferometry was achieved by increasing the optical path difference between the test and the reference surface. But, Linnik interferometer cause defocusing problem to create these carrier fringes. We propose in this paper to combine reflectometry and spectrally resolved phase shifting interferometry for measurement of surface and film thickness profile with the use of Michelson objective. Michelson objective will be convenient to implement as compared to the Linnik type and the use of phase shifting interferometry does not necessarily need large number of fringes in the spectral domain.

show abstract

Section: Introductionmentioning

confidence: 99%

Determination of film thickness and surface profile using reflectometry and spectrally resolved phase shifting interferometry

Debnath

You

Kim

2009

Int. J. Precis. Eng. Manuf.

View full text Add to dashboard Cite

show abstract

“…Inside the interferometer, the incident light is divided into two parts, referred to as the testing beam and the reference beam; the interferogram can only be imaged by the CCD when the target area of the sample stays within the coherence length [11][12][13].…”

Section: Principle Of Nmm Based White Light Tilt Scanning Interferometrymentioning

confidence: 99%

A nanomeasuring machine based white light tilt scanning interferometer for large scale optical array structure measurement

Guo

Zhao

et al. 2011

Optics and Lasers in Engineering

View full text Add to dashboard Cite

“…Thus, by looking at the sample position for which the fringe contrast is maximum while the object is scanned along the height axis, one can determine the height variations over the object field. [1][2][3][4][5][6][7][8][9][10][11][12] In this measurement, there are no height ambiguities. This procedure is also known as scanning white light interferometry ͑SWLI͒ or coherence interferometry.…”

Section: Introductionmentioning

confidence: 95%

Optical profiler based on spectrally resolved white light interferometry

Debnath

Kothiyal

2005

Opt. Eng

View full text Add to dashboard Cite

A white light interferogram can be decomposed into its constituent monochromatic interferograms using a spectrograph. By imaging the white light interferogram on the entrance slit of the spectrograph, the intensities of the monochromatic components can be accessed at its output plane by the pixels of a CCD detector along the direction of dispersion. For a given optical path difference (OPD) in the interferometer, the phases of these constituents are different and linearly related to the wave number of the constituent spectral component. If the phases of all the constituents are determined, the OPD can be obtained as the slope of the phase versus wave number linear fit. Since the OPD is related to the height of the test object at a point, a line profile of the object can be determined if the OPD is measured along the pixels of the CCD parallel to the entrance slit of the spectrograph. To get at the line profile, we must therefore determine the optical phase at all the pixels of the CCD detector. The phase-shifting technique is an obvious choice for this. A piezoelectric transducer (PZT) phase shifter is most common in the application of the phase-shifting technique to monochromatic interferometry. We present the experimental result based on our recent proposal that the conventional PZT phase shifting, although nonachromatic, can be used for this application as well with success. © 2005 Society of Photo-Optical Instrumentation Engineers.

show abstract

Unambiguous profilometry by fringe-order identification in white-light phase-shifting interferometry

Cited by 109 publications

References 11 publications

Determination of film thickness and surface profile using reflectometry and spectrally resolved phase shifting interferometry

Determination of film thickness and surface profile using reflectometry and spectrally resolved phase shifting interferometry

A nanomeasuring machine based white light tilt scanning interferometer for large scale optical array structure measurement

Optical profiler based on spectrally resolved white light interferometry

Contact Info

Product

Resources

About