Understanding of the correlation between work function and surface morphology of metals and alloys

Effect of electrode surface topology on charge injection characteristics in dielectric liquids: An experimental study

“…Liu et al [20] performed a numerical study of different orientations/alignments and arrays (vertical, tilt, rainbow shaped and spiral) of CNT and showed that the electric field for a particular orientation is maximum at its tip; the one with the maximum aspect ratio produced the highest field. The current experimental results are in agreement with the findings of [19,20] as seen in the higher current for the etchedeetched (R z ¼ 2.28 mm) configuration compared to the smoothesmooth (R z ¼ 0.58 mm) configuration. The sharpness (e.g.…”

“…7). Xue et al [19] experimentally found that sharp micro/nano features at a rough surface resulted in a lower work function. At the tip of a micro/nano structure, an atom has lesser coordination atoms surrounding it than those at a flat surface which causes the maximum electric field to occur at the tip of a sharp feature.…”

Graphite–metal composite electrodes with a tunable work function for use in optoelectronic devices

“…In particular, the weak interaction between valence electrons and nuclei on rough surfaces facilitates the escape of electrons from the surface, resulting in a low WF. 4 The introduction of small molecules or a non-conjugated polyelectrolyte interface layer can also change the electrical field distribution between the semiconductor and the electrode. This electric field redistribution leads to Fermi level pinning, electric double-layer formation, charge transfer, spontaneous dipole orientation, spontaneous interfacial dipole orientation, 5 electron pushback (repulsion), and interface dipole formation.…”

“…In particular, the weak interaction between valence electrons and nuclei on rough surfaces facilitates the escape of electrons from the surface, resulting in a low WF. 4…”

Using SKPFM to Determine the Influence of Deformation-Induced Dislocations on the Volta Potential of Copper

“…That is, the potential fluctuations measured by SKP are essentially averaged over dozens of grains. Second, the EWF is sensitive to surface geometrical configurations [10], such as the surface roughness [11] and microcracks [12], which can be regarded as an interference factor in SKP measurement.…”