Understanding the Effect of Hydrogen Surface Passivation and Etching on the Shape of Silicon Nanocrystals

Hawa, Takumi; Zachariah, Michael R.

doi:10.1021/jp800780s

Cited by 16 publications

(14 citation statements)

References 55 publications

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“…[117] Moreover, molecular dynamic simulation suggested that the presence of H in the plasma favored the formation of cubic-shaped nanocrystals. [119] …”

Section: Particle Dispersion and Crystallinitymentioning

confidence: 99%

Plasma‐Assisted Approaches in Inorganic Nanostructure Fabrication

et al. 2010

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Plasma is a unique medium for chemical reactions and materials preparations, which also finds its application in the current tide of nanostructure fabrication. Although plasma-assisted approaches have been long used in thin-film deposition and the top-down scheme of micro-/nanofabrication, fabrication of zero- and one-dimensional inorganic nanostructures through the bottom-up scheme is a relatively new focus of plasma application. In this article, recent plasma-assisted techniques in inorganic zero- and one-dimensional nanostructure fabrication are reviewed, which includes four categories of plasma-assisted approaches: plasma-enhanced chemical vapor deposition, thermal plasma sintering with liquid/solid feeding, thermal plasma evaporation and condensation, and plasma treatment of solids. The special effects and the advantages of plasmas on nanostructure fabrication are illustrated with examples, emphasizing on the understandings and ideas for controlling the growth, structure, and properties during plasma-assisted fabrications. This Review provides insight into the utilization of the special properties of plasmas in nanostructure fabrication.

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“…[117] Moreover, molecular dynamic simulation suggested that the presence of H in the plasma favored the formation of cubic-shaped nanocrystals. [119] …”

Section: Particle Dispersion and Crystallinitymentioning

confidence: 99%

Plasma‐Assisted Approaches in Inorganic Nanostructure Fabrication

et al. 2010

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“…Reproduced from[152] by permission of IOP Publishing. All rights reserved]; surface coverage by hydrogen is a key factor in thermokinetic shape selection (b) [Reprinted/adapted with permission from[155]. Copyright c (2008) American Chemical Society].…”

mentioning

confidence: 99%

Plasma nanoscience: from nano-solids in plasmas to nano-plasmas in solids

Ostrikov

Neyts

Meyyappan

2013

Advances in Physics

498

391

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The unique plasma-specific features and physical phenomena in the organization of nanoscale solid-state systems in a broad range of elemental composition, structure, and dimensionality are critically reviewed. These effects lead to the possibility to localize and control energy and matter at nanoscales and to produce self-organized nano-solids with highly unusual and superior properties. A unifying conceptual framework based on the control of production, transport, and self-organization of precursor species is introduced and a variety of plasmaspecific non-equilibrium and kinetics-driven phenomena across the many temporal and spatial scales is explained. When the plasma is localized to micrometer and nanometer dimensions, new emergent phenomena arise. The examples range from semiconducting quantum dots and nanowires, chirality control of single-walled carbon nanotubes, ultra-fine manipulation of graphenes, nano-diamond, and organic matter, to nano-plasma effects and nano-plasmas of different states of matter. Contents

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“…During the hydrogen etching process, both etching and redeposition of the Si atoms/radicals occur and the Si surface was reproduced to have the most energetically stable shapes [ 18 , 21 ]. The (100) surface of Si is more rapidly etched than (110) and (111) surfaces [ 22 ]. As a result, pyramid-shaped Si nanostructures of which side faces comprise energetically stable (111) crystalline surfaces are formed [ 23 ].…”

Section: Resultsmentioning

confidence: 99%

Enhancement of antireflection property of silicon using nanostructured surface combined with a polymer deposition

Yoo

Cho

et al. 2014

Nanoscale Res Lett

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Silicon (Si) nanostructures that exhibit a significantly low reflectance in ultraviolet (UV) and visible light wavelength regions are fabricated using a hydrogen etching process. The fabricated Si nanostructures have aperiodic subwavelength structures with pyramid-like morphologies. The detailed morphologies of the nanostructures can be controlled by changing the etching condition. The nanostructured Si exhibited much more reduced reflectance than a flat Si surface: an average reflectance of the nanostructured Si was approximately 6.8% in visible light region and a slight high reflectance of approximately 17% in UV region. The reflectance was further reduced in both UV and visible light region through the deposition of a poly(dimethylsiloxane) layer with a rough surface on the Si nanostructure: the reflectance can be decreased down to 2.5%. The enhancement of the antireflection properties was analyzed with a finite difference time domain simulation method.

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Understanding the Effect of Hydrogen Surface Passivation and Etching on the Shape of Silicon Nanocrystals

Cited by 16 publications

References 55 publications

Plasma‐Assisted Approaches in Inorganic Nanostructure Fabrication

Plasma‐Assisted Approaches in Inorganic Nanostructure Fabrication

Plasma nanoscience: from nano-solids in plasmas to nano-plasmas in solids

Enhancement of antireflection property of silicon using nanostructured surface combined with a polymer deposition

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