Tellurium‐based screen‐printable conductor metallization pastes containing multiple inorganic solid‐state frits (ie, metallization pastes containing two or more individual discrete tellurium‐based frits) were evaluated on p‐type, mono‐crystalline silicon passivated emitter rear cell (PERC) wafers. Individual discrete frits with tellurium‐lead‐metal‐oxygen compositions of
Tenormalx()Pby0.25emMz0.25emMnormalz''0.25emMnormalznormalii()1−normalxnormaln+On+2 were prepared with varying ratios of tellurium and lead cations. Screen‐printed solar cells fabricated from metallization pastes containing multiple discrete frits (two, three, and four discrete frits) had state‐of‐the‐art solar cell electrical properties (Eff = 21.1%). Mechanisms for the oxidation, dissolution, and removal of the SiNx:H antireflective coating (ARC) by tellurium‐based metallizations during solar cell firing are examined. In situ thermal analysis of a model frit‐silicon nitride system shows that frit glass transition temperatures coincide with the onset of silicon nitride oxidation during heating in accord with dissolution reactions. The advantage of multiple frit systems is an inherent ability to fine‐tune the final chemistry of the conductor metallization, beyond what is possible with single frit systems, to further improve solar cell performance, which is essential for advanced crystalline silicon solar cell devices and continued reductions in processing costs.