2017
DOI: 10.7567/jjap.56.08mb07
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Understanding the influence of tellurium oxide in front Ag paste for contacting silicon solar cells with homogeneous high sheet resistance emitter

Abstract: This paper investigates TeO2, one of the front Ag paste additives, to understand its role in low contact and gridline resistances for screen-printed Si solar cell. It is concluded that TeO2 aids the reduction of molten glass frit viscosity during contact co-firing. This in turn, leads to uniform flow of molten glass frit, both in the gridline bulk and interface of gridline and SiNx. Therefore, the uniform wetting and etching of SiNx and consequently larger contact area of metal to Si compared to its counterpar… Show more

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Cited by 10 publications
(2 citation statements)
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“…Ag paste has been recently improved by replacing the conventional PbO-based glass frits with TeO 2 -based ones, thereby facilitating the fabrication of high-quality ohmic contacts with the Pdoped Si emitter with an R sh value of $100 Ω/sq. 27,28 Nevertheless, commercially available Ag pastes still yield poor contact quality when the R sh of the P-doped Si emitter is >130 Ω/sq. Al-containing Ag (Ag/Al) pastes are commonly employed for contacting B-doped Si emitters.…”
Section: Introductionmentioning
confidence: 99%
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“…Ag paste has been recently improved by replacing the conventional PbO-based glass frits with TeO 2 -based ones, thereby facilitating the fabrication of high-quality ohmic contacts with the Pdoped Si emitter with an R sh value of $100 Ω/sq. 27,28 Nevertheless, commercially available Ag pastes still yield poor contact quality when the R sh of the P-doped Si emitter is >130 Ω/sq. Al-containing Ag (Ag/Al) pastes are commonly employed for contacting B-doped Si emitters.…”
Section: Introductionmentioning
confidence: 99%
“…The continuous demand for enhanced conversion efficiency requires the adoption of lightly doped n + ‐Si emitters with sheet resistance ( R sh ) of >100 Ω/sq or B‐doped p + ‐Si emitters, which was previously hampered by the high contact resistance of screen‐printed Ag metallization. Ag paste has been recently improved by replacing the conventional PbO‐based glass frits with TeO 2 ‐based ones, thereby facilitating the fabrication of high‐quality ohmic contacts with the P‐doped Si emitter with an R sh value of ~100 Ω/sq 27,28 . Nevertheless, commercially available Ag pastes still yield poor contact quality when the R sh of the P‐doped Si emitter is >130 Ω/sq.…”
Section: Introductionmentioning
confidence: 99%