This study aims at investigating the distortion of poly(dimethylsiloxane)
(PDMS) nanostructures
in a soft lithography demolding process using molecular dynamics simulation.
Experimental results show that after peeling, PDMS nanopillars became
10–60% longer in height than the mold size. Molecular dynamics
simulations have been employed to plot the stress–strain curve
of the nanopillars when subjected to uniaxial stress. Three force
fields (COMPASS, CVFF, and PCFF) were used for modeling. The demolding
process in soft lithography and nanoimprint lithography causes significant
deformation in replication. The experimental results show clear signs
of elongation after demolding. Molecular dynamics simulations are
employed to study the stress–strain relationship of the PDMS
nanopillars. The results from the simulation show that a PDMS nanopillar
at temperature T = 300 K under tensile stress shows
characteristics of flexible plastic under tensile stress and has a
lower Young’s modulus, ultimate tensile stress, and Poisson’s
ratio.