1996
DOI: 10.1016/0003-2670(96)00271-1
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Use of a low power, high frequency stabilized capacitive plasma combined with graphite furnace vaporization for the atomic emission spectrometric analysis of serum samples

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Cited by 6 publications
(1 citation statement)
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“…They have been used for the analysis of liquid, conducting and non-conducting solid samples and as a specific detector in gas chromatography. [22][23][24][25][26][27][28][29][30] At the same time the figures of merits for some elements are similar to those obtained with other plasma sources, such as microwave capacitively coupled plasma atomic emission spectrometry (CMP-AES). 23,31,32 In our laboratory a low power rf-CCP (60 W and 185 W) has been used for the direct analysis of solid samples.…”
Section: Introductionsupporting
confidence: 53%
“…They have been used for the analysis of liquid, conducting and non-conducting solid samples and as a specific detector in gas chromatography. [22][23][24][25][26][27][28][29][30] At the same time the figures of merits for some elements are similar to those obtained with other plasma sources, such as microwave capacitively coupled plasma atomic emission spectrometry (CMP-AES). 23,31,32 In our laboratory a low power rf-CCP (60 W and 185 W) has been used for the direct analysis of solid samples.…”
Section: Introductionsupporting
confidence: 53%