Use of Cr Interlayer to Promote the Adhesion of SiC Films Deposited on Ti-6Al-4V by HiPIMS

Merij, Abrão Chiaranda; Sugahara, Tarcila; Martins, Guilherme; Sobrinho, Argemiro Soares da Silva; Reis, Danieli Aparecida Pereira; Radi, Polyana Alves; Massi, M.

doi:10.1590/1516-1439.313114

Cited by 7 publications

(4 citation statements)

References 11 publications

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“…At such small and unstable substrate biasing, all six films present similar columnar cross-sectional features, which are in the range of Zone 1 according to the structure zone model proposed by Anders based on Thornton's structure zone model [21]. Chromium films of pulse width 60 µs and deposition pressure 1.2 Pa exhibit an individual tetrahedron-top columns morphology, which is similar to chromium films deposited by a direct current or a radio frequency magnetron sputtering [6,18,[22][23][24][25].…”

Section: Effects Of the Deposition Pressure And The Hipims Pulse Widt...mentioning

confidence: 69%

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Effects of Cathode Voltage Pulse Width in High Power Impulse Magnetron Sputtering on the Deposited Chromium Thin Films

Kuo

Lin

Lin³

et al. 2020

Coatings

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Environmentally-safe high-power impulse magnetron sputtering (HiPIMS) technology was utilized to deposit chromium films. This research focused on the influences of the HiPIMS pulse widths on the microstructure of films deposited at different deposition pressures and substrate bias voltages. Under the conditions of the same average HiPIMS power and duty cycle, the deposition rate of the Cr thin film at working pressure 0.8 Pa is slightly higher than at 1.2 Pa. Also, the difference between deposition rates under two pressures decreases with the discharge pulse width. The deposition rate of the short pulse width 60 μs is lowest, but those of 200 and 360 μs are approximately the same. With no or small direct current substrate biasing, the microstructure of films coated at short pulse width is similar to the typical magnetron sputtering deposited films. Elongating the pulse width enhances the ion flux toward the substrate and changes the film structure from individual prism-like columns into tangled 3-point/4-point star columns. Substantial synchronized substrate biasing and longer pulse width changes the preferred orientation of Cr films from Cr (110) to Cr (200) and Cr (211). The films deposited at longer pulse width exhibit a higher hardness due to the reducing of intercolumn voids.

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Section: Effects Of the Deposition Pressure And The Hipims Pulse Widt...mentioning

confidence: 69%

“…Environmentally-safe physical vapor depositions (PVD) can provide a simple yet reliable chromium coating [2][3][4][5]. In addition to being the protective and decorative top-coat layer, chromium layers can also be used as the adhesion enhancement interlayer for nitride and carbide coatings [6,7].…”

Section: Introductionmentioning

confidence: 99%

Effects of Cathode Voltage Pulse Width in High Power Impulse Magnetron Sputtering on the Deposited Chromium Thin Films

Kuo

Lin

Lin³

et al. 2020

Coatings

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“…These oxides are essential for biomedical applications, as they are responsible for the biocompatibility of the alloy [12]. In addition, the presence of TiO 2 is responsible for the remarkable corrosion resistance of titanium alloys, due to the formation of an adherent, compact, and continuous passive layer that protects the material [12][13][14][15][16]. However, its tribological characteristics are susceptible to accelerated corrosion process when subjected to frictional wear [17][18][19][20].…”

Section: Introductionmentioning

confidence: 99%

Effect of plasma immersion ion implantation on wear behavior of Ti-6Al-4V alloy

Resende

Silva

Oliveira

et al. 2023

Surf. Topogr.: Metrol. Prop.

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Ti-6Al-4V alloy is ideal for use in the aeronautical and aerospace industries because of its excellent strength/weight ratio and corrosion resistance. However, its applications at high temperatures are vulnerable due to its high affinity for interstitial elements, such as nitrogen and oxygen. The plasma immersion ion implantation (PIII) technique, performed at high temperature, allows formation of modified layers that can improve the mechanical and tribological properties without compromising the corrosion resistance, which is a characteristic of this alloy. In this work, the samples were treated by PIII at three different temperatures (700, 800, and 900 °C) for 120 min of exposure to evaluate PIII on the mechanical behavior of Ti-6Al-4V alloy compared to data already available in the literature. The aim of this process is to improve surface mechanical properties of the Ti-6Al-4V alloy. The techniques used in this work were X-ray diffraction microhardness, glow discharge optical emission spectrometer, and wear testing in a ball-on-disk tribometer. The results indicate a significantly increased material resistance, with a reduced wear for all treated samples and a reduced friction coefficient for samples treated at 800 and 900 °C. The best results were for alloy treated at 800 and 900 °C, because they maintain the low coefficient throughout the test, which indicates better wear resistance.

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“…Surface treatments of plasma nitriding 9,13 and the application of Cr interlayer SiC film deposited by HiPIMS 14,15 have been studied by this research group and the objective of this work is to verify under what conditions each one of them may be considered more appropriate. Figure 1 shows the geometry and dimensions of the specimens applied in the creep tests.…”

Section: Introductionmentioning

confidence: 99%

Analysis of the Surface Treatments Effect on the Creep Behavior of Ti-6Al-4V Alloy

et al. 2020

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This paper compares the creep behavior of Ti-6Al-4V alloy after different surface treatments, the plasma nitriding using Plasma Enhanced Chemical Vapor Deposition (PECVD), and the deposition of SiC thin films with Cr interlayer using High Power Impulse Magnetron Sputtering (HiPIMS). A microstructural characterization was performed with Scanning Electron Microscopy (SEM), Scanning and Transmission Electron Microscopy (STEM), and Energy Dispersive Spectroscopy (EDS) techniques. The creep test was performed at a constant load from 500 to 600 °C and 125 to 319 MPa, and a fractographic analysis was performed. The EDS analysis of the plasma nitrided layer indicated the nitrogen presence of the compounds TiN and Ti 2 N and an increase in the iron concentration. Creep test results in both conditions indicated an increase in the creep resistance. Plasma nitrided condition indicated the lowest creep rate and lesser elongation, making it the most suitable in applications that require a low dimensional distortion.

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Use of Cr Interlayer to Promote the Adhesion of SiC Films Deposited on Ti-6Al-4V by HiPIMS

Cited by 7 publications

References 11 publications

Effects of Cathode Voltage Pulse Width in High Power Impulse Magnetron Sputtering on the Deposited Chromium Thin Films

Effects of Cathode Voltage Pulse Width in High Power Impulse Magnetron Sputtering on the Deposited Chromium Thin Films

Effect of plasma immersion ion implantation on wear behavior of Ti-6Al-4V alloy

Analysis of the Surface Treatments Effect on the Creep Behavior of Ti-6Al-4V Alloy

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