Using microcontact printing to generate amplitude photomasks on the surfaces of optical fibers: A method for producing in-fiber gratings

Rogers, John A.; Jackman, Rebecca J.; Whitesides, George M.; Wagener, J.L.; Vengsarkar, Ashish M.

doi:10.1063/1.119313

Cited by 58 publications

(27 citation statements)

References 15 publications

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“…We recommend using a micromanipulator such as the one employed by Rogers et al [24]. Their apparatus incorporates a laser to ensure proper alignment of the stamp and the capillary on the rotation and translation stages.…”

Section: Conclusion and Recommendations For Future Work: Try Contactmentioning

confidence: 99%

“…Rogers et al [24] printed copper bands on the surface of a 125-µm-O.D. optical fiber to create an amplitude photomask.…”

Section: Background: Microcontact Printing Has Been Used In a Wide Vamentioning

confidence: 99%

“…Many groups have successfully transferred a wide variety of patterns to both 2-D [2-17] and 3-D [3,7,8,[18][19][20][21][22][23][24][25][26][27] substrates using microcontact printing. Some innovative 2-D applications resulted in a variety of end uses.…”

Section: Background: Microcontact Printing Has Been Used In a Wide Vamentioning

confidence: 99%

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Exploring the Feasibility of Fabricating Micron-Scale Components Using Microcontact Printing LDRD Final Report

Myers¹,

Ritchey²,

Stokes³

et al. 2003

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Many microfabrication techniques are being developed for applications in microelectronics, microsensors, and micro-optics. Since the advent of microcomponents, designers have been forced to modify their designs to include limitations of current technology, such as the inability to make three-dimensional structures and the need for piece-part assembly. Many groups have successfully transferred a wide variety of patterns to both two-dimensional and three-dimensional substrates using microcontact printing. Microcontact printing is a technique in which a self-assembled monolayer (SAM) is patterned onto a substrate by transfer printing. The patterned layer can act as an etch resist or a foundation upon which to build new types of microstructures. We created a gold pattern with features as small as 1.2 µm using microcontact printing and subsequent processing. This approach looks promising for constructing single-level structures such as microelectrode arrays and sensors. It can be a viable technique for creating three-dimensional structures such as microcoils and microsprings if the right equipment is available to achieve proper alignment, and if a means is available to connect the final parts to other components in subsequent assembly operations. Microcontact printing provides a wide variety of new opportunities in the fabrication of microcomponents, and increases the options of designers.4

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Section: Conclusion and Recommendations For Future Work: Try Contactmentioning

confidence: 99%

“…Rogers et al [24] printed copper bands on the surface of a 125-µm-O.D. optical fiber to create an amplitude photomask.…”

Section: Background: Microcontact Printing Has Been Used In a Wide Vamentioning

confidence: 99%

See 1 more Smart Citation

Exploring the Feasibility of Fabricating Micron-Scale Components Using Microcontact Printing LDRD Final Report

Myers¹,

Ritchey²,

Stokes³

et al. 2003

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“…Representative soft-lithographic techniques that have found varying degrees of attention in research and for possible applications in technology include microcontact printing ͑ CP͒, [5][6][7] replica molding ͑REM͒, 8,9 microtransfer molding ͑ TM͒, [10][11][12][13] micromolding in capillaries ͑MIMIC͒, [14][15][16] and solvent assisted micromolding ͑SAMIM͒. 17 These techniques are useful for fabricating a variety of functional components and devices for use in areas such as optics, 18,19 microelectronics, [20][21][22] microanalysis, [23][24][25][26] and microelectromechanical system ͑MEMS͒. 27 The work reported to date establishes the broad utility of PDMS as a foundation material for soft-lithographic patterning-its properties being exploited with benefit for myriad forms of contact-lithographic patterning and, more recently, as a component material for constructing the complex forms of MEMS and microfluidic devices.…”

Section: Introductionmentioning

confidence: 99%

Micron and submicron patterning of polydimethylsiloxane resists on electronic materials by decal transfer lithography and reactive ion-beam etching: Application to the fabrication of high-mobility, thin-film transistors

Ahn

Lee

Childs

et al. 2006

Journal of Applied Physics

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We describe a technique for fabricating micron and submicron-sized polydimethylsiloxane ͑PDMS͒ patterns on electronic material substrates using decal transfer lithography ͑DTL͒ in conjunction with reactive ion-beam etching ͑RIE͒. We validate the use of this unconventional polymeric system as a suitable resist material for fabricating Si-based microelectronic devices. In this process, an O 2 /CF 4 gas mixture was used to etch a supporting PDMS thin film that resides atop a closed-form decal polymer to reveal conventional resist structures. These structures provide an effective latent image that, in turn, provides for an extension of soft lithography as a form of multilayer lithography-one yielding submicron structures similar to those obtained from the conventional photochemical methods used to prepare such resists. This combined DTL/RIE patterning procedure was found to be compatible with commercially available planarization layers and provides a direct means for preparing high aspect ratio resist features. We illustrate the applicability of soft lithography as a means for fabricating electronic devices by using it to prepare model silicon-based thin-film transistors exploiting silicon-on-insulator wafer technology.

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“…10 The ability to pattern curved surfaces is desired in many fields, such as MEMS, electronic devices, and optics, 7 such as the recent demonstration of the fabrication of a highperformance, hemispherical electronic eye camera by Ko et al 12 A major feature of soft lithography is the ability to pattern features on highly curved and other nonplanar surfaces. 13,14 This type of patterning task is impossible to accomplish with a conventional rigid NIL mold.…”

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confidence: 99%

Hybrid Nanoimprint−Soft Lithography with Sub-15 nm Resolution

et al. 2009

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We developed a hybrid nanoimprint-soft lithography technique with sub-15 nm resolution. It is capable of patterning both flat and curved substrates. The key component of the technology is the mold, which consists of rigid features on an elastic poly(dimethylsiloxane) (PDMS) support. The mold was fabricated by imprinting a reverse image onto the PDMS substrate using a UV-curable low-viscosity prepolymer film. Patterns with sub-15-nm resolution were faithfully duplicated on a flat substrate without applying external pressure. Gratings at 200 nm pitch were also successfully imprinted onto the cylindrical surface of a single mode optical fiber with a 125 µm diameter.

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Using microcontact printing to generate amplitude photomasks on the surfaces of optical fibers: A method for producing in-fiber gratings

Cited by 58 publications

References 15 publications

Exploring the Feasibility of Fabricating Micron-Scale Components Using Microcontact Printing LDRD Final Report

Exploring the Feasibility of Fabricating Micron-Scale Components Using Microcontact Printing LDRD Final Report

Micron and submicron patterning of polydimethylsiloxane resists on electronic materials by decal transfer lithography and reactive ion-beam etching: Application to the fabrication of high-mobility, thin-film transistors

Hybrid Nanoimprint−Soft Lithography with Sub-15 nm Resolution

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