Developing photothermal anti/deicing fluor‐free composite coatings with high wear resistance and liquid puncture resistance is an interesting challenge. Herein, a new biomass benzoxazine monomer (C‐d) was synthesized, which was then sprayed on a glass slide, followed by spraying hyperbranched polysiloxane (HSi), polydopamine‐coated micro AlN (P@mAlN), and polydopamine‐coated nano AlN (P@nAlN), successively, to develop a new type of photothermal anti/deicing four‐layer fluor‐free composite coatings with high wear resistance and liquid puncture resistance (C‐d/yHSi/0.4P@2bAlN, y is the mass ratio of HSi to C‐d). Three‐layer composite coatings (C‐d/0.4P@zbAlN, z is the mass ratio of P@mAlN to P@nAlN) and two‐layer composite coatings (C‐d/xP@mAlN, x is the mass ratio of P@mAlN to C‐d) were also prepared to study the influence of compositions on comprehensive properties of coatings. The results show that C‐d/0.4P@zbAlN has significantly longer icing delay time (IDT) than C‐d and C‐d/xP@mAlN coatings but still shows poor wear resistance and liquid puncture resistance. Interestingly, C‐d/yHSi/0.4P@2bAlN coatings have good superhydrophobicity; as y increases, both IDT and wear resistance increase significantly. When y = 0.5, the obtained C‐d/0.5HSi/0.4P@2bAlN coating has the best integrated performance, including high anti‐deicing property (IDT = 627 s), high wear resistance, and liquid puncture resistance as well as good photothermal deicing performance, the ice melts in 343 s under the irradiation with 808 nm infrared light, overcoming the bottleneck of poor wear resistance and liquid puncture resistance of photothermal anti/deicing coatings. Besides, C‐d/0.5HSi/0.4P@2bAlN coating can effectively prevent the adhesion of pollutants and remain superhydrophobicity after soaked in different solutions (pH = 1–10).Highlights
A new biomass benzoxazine with good flexibility was synthesized.
Photo‐thermal anti/deicing coatings with micro/nanostructured surfaces are built.
The fluor‐free coatings have excellent wear resistance and chemical resistance.
The mechanism behind was elucidated.