UV-NIL with working stamps made from Ormostamp

Mühlberger, M.; Bergmair, Iris; Klukowska, Anna; Kolander, Anett; Leichtfried, Hans; Platzgummer, Elmar; Loeschner, Hans; Ebm, Christoph; Grützner, Gabi; Schöftner, Rainer

doi:10.1016/j.mee.2008.11.020

Cited by 59 publications

(34 citation statements)

References 7 publications

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“…Polymeric working stamps for transfer printing were made from OrmoStamp ® , a UV-curable organic/inorganic hybrid polymer that can be used to replicate silicon molds in a process similar to UV-nanoimprint lithography (UV-NIL) [15]. The stamp fabrication process is shown schematically in Fig.…”

Section: B Transfer Printing Of Metal Contactsmentioning

confidence: 99%

High-yield metal transfer printing on alkyl bis-phosphonate monolayers

Pathak¹,

Bora²,

Tornow³

et al. 2015

2015 IEEE 15th International Conference on Nanotechnology (IEEE-NANO)

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The successful transfer printing of thin metal films onto monolayers of aliphatic bisphosphonic acids (bisPAs) is reported. These monolayers were prepared from solution on plasma-grown aluminum oxide, and were compared with analogous monolayers of alkyl monophosphonic acids (monoPAs) for transfer printing efficacy. Water contact angle and AFM measurements indicated uniform films formed from both classes of phosphonic acids. Evaporated Au/Ti films were prepared using patterned polymeric stamps, and were transfer printed onto the various phosphonate monolayers; this process resulted in close to 100% yield for bisPA monolayers, but only poor results were measured for the monoPAs. We attribute efficient printing onto bisPA monolayers to the formation of strong chemical bonds between distal phosphonic acid groups and the stamp-adhered metal film via its native Ti-oxide termination.

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Section: B Transfer Printing Of Metal Contactsmentioning

confidence: 99%

High-yield metal transfer printing on alkyl bis-phosphonate monolayers

Pathak¹,

Bora²,

Tornow³

et al. 2015

2015 IEEE 15th International Conference on Nanotechnology (IEEE-NANO)

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“…Several reports point out the fabrication of the PDMS mold as the limiting factor to high fidelity replication; either its high viscosity [12] or its easy deformability [13] seems to be an important drawback for an optimum sub-micron resolution. However, different approaches in the intermediate mold fabrication lead to resolutions around 50 nm, which have been achieved by working with more favorable master textures consisting of periodical arrangements of dots [12] and square shaped pillars [14].…”

Section: Introductionmentioning

confidence: 99%

High fidelity transfer of nanometric random textures by UV embossing for thin film solar cells applications

Escarré

Söderström

Battaglia

et al. 2011

Solar Energy Materials and Solar Cells

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a b s t r a c tWe investigate the transfer of random nanostructures commonly used in thin film silicon solar cells onto inexpensive substrates, such as glass or flexible polyethylene sheets. Morphological and optical analyses of masters and replicas show the successful transfer of details with sizes much below 1 mm. These highquality replicas are obtained by UV nano-imprinting, avoiding the use of PDMS as an intermediate mold, which has been identified as being responsible for the lack of resolution found in previous works.

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“…More information about the chemistry, composition, and surface properties of Ormostamp can be found in the works by Klukowska et al [18][19][20][21] The final structures are patterned following the same replication process, using the negative replica as a stamp. First of all, it is transparent to the UV light even after cured, which is necessary for its use as a stamp in the second UV-NIL step.…”

Section: Double Replication Processmentioning

confidence: 99%

Fabrication of fluidic devices with 30 nm nanochannels by direct imprinting

Fernández-Cuesta¹,

Palmarelli²,

Liang³

et al. 2011

Journal of Vacuum Science & Technology B, Nanotechnology an

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Fabrication of a seamless roll mold by direct writing with an electron beam on a rotating cylindrical substrate Fabrication of 100 nm metal lines on flexible plastic substrate using ultraviolet curing nanoimprint lithographyIn this work, we propose an innovative approach to the fabrication of a complete micro/nano fluidic system, based on direct nanoimprint lithography. The fabricated device consists of nanochannels connected to U-shaped microchannels by triangular tapered inlets, and has four large reservoirs for liquid input. A master silicon stamp with the multilevel structures is fabricated first, and then a negative replica is made, to be used as a stamp for ultraviolet nanoimprint lithography (UV-NIL). Afterwards, just one single UV-NIL step is necessary for patterning all the the micro and nanostructures. Furthermore, the devices are made of all-transparent materials, and the method allows flexibility for the type of substrates used. The active material (an inorganic-organic hybrid polymer) used for the fabrication of the device has been carefully chosen, so it has adequate surface properties (inert and hydrophilic) for its direct use for biological applications. Devices having 30 nm wide, 30 nm deep nanochannels have been fabricated, and the successful performance of the fluidic system and the continuity of the nanochannels have been proven by flow tests.

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UV-NIL with working stamps made from Ormostamp

Cited by 59 publications

References 7 publications

High-yield metal transfer printing on alkyl bis-phosphonate monolayers

High-yield metal transfer printing on alkyl bis-phosphonate monolayers

High fidelity transfer of nanometric random textures by UV embossing for thin film solar cells applications

Fabrication of fluidic devices with 30 nm nanochannels by direct imprinting

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