UV optical record and electron beam lithography in polymer films

Gerbreders, A.; Shimane, O; Kolobjonoks, Vadims; Teteris, J.

doi:10.1088/1757-899x/38/1/012027

Cited by 2 publications

(2 citation statements)

References 19 publications

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“…Versatile optical elements (refractive elements [7], optical storage elements [8][9][10]) can be fabricated using such media. Carbazolecontaining polymers can be used for both optical and electron-beam recording, which may be of interest for the implementation of combined recording [11]. To increase the light sensitivity of recording materials, their optical sensitization is of great importance [12][13][14].…”

Section: Introductionmentioning

confidence: 99%

Direct magnetic and surface relief patterning using carbazole-based azopolymer

Paiuk

Meshalkin

Stronski

et al. 2023

Phys. Chem. Solid St.

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The results on using of carbazole-based azopolymer layers (Polyepoxypropylcarbazole:Methyl Red with magnetic particles of Fe2SO4) for the recording of 1-D and 2-D surface relief gratings are presented in this report. Morphology study using AFM and MFM of obtained structures has shown their good quality. Surface relief gratings with profile height up to 1.2 µm were obtained during the holographic recording using blue laser. Along with surface relief grating it was shown the direct formation of magnetic relief. Possibility of simultaneous direct fabrication of surface and magnetic relief by optical holographic recording using azopolymer thin films as recording media was shown.

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Section: Introductionmentioning

confidence: 99%

Direct magnetic and surface relief patterning using carbazole-based azopolymer

Paiuk

Meshalkin

Stronski

et al. 2023

Phys. Chem. Solid St.

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“…So, recently we have presented the paper [10], in which the influence of UV-illumination on polymer films was described. Direct surface relief was formed by 248 nm laser illumination in exposure range 10 -2200 J/cm 2 .…”

Section: Introductionmentioning

confidence: 99%

Direct Surface Relief Formation in Polymer Films

Gerbreders

Kolobjonoks

Shimane

et al. 2013

KEM

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Due to active development of nanoelectronics, the studies of methods of nanorelief surface formation in different materials, in particular polymers are very important. Organic polymer films in consequence of their dielectric and optical properties have been used as basis of these devices. In this paper, the possibility of UV optical record and electron beam lithography in different type of polymeric films was studied. Mechanisms of molecular structure changes: photoisomerization, destruction, cross-linking and oxidation have been discussed. The results of UV illumination of polyurethanes, polyacrylates, and some block-copolymers were described. The element analysis of polybutadiene block copolymer was performed before and after UV illumination, and the changes in optical transmission spectra of the polymer film were measured. The resolution of electron beam lithography on polymeric films also was studied.

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UV optical record and electron beam lithography in polymer films

Cited by 2 publications

References 19 publications

Direct magnetic and surface relief patterning using carbazole-based azopolymer

Direct magnetic and surface relief patterning using carbazole-based azopolymer

Direct Surface Relief Formation in Polymer Films

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