Abstract. Possibility of UV optical record and electron beam lithography in different type of organic polymer films was studied. Mechanisms of molecular structure changes: photoisomerization, destruction, cross-linking and oxidation have been discussed. The results of UV illumination of polyurethanes, polyacrilates, and some block-copolymers are described. The element analysis of polyisoprene block copolymer was performed before and after UV illumination, and the changes in transmission spectra of the polymer film were measured. The resolution of electron beam lithography on polymer films was studied. In the polyisoprene block copolymer film the oxidation polymerization was ascertain at UV-illumination.

Due to active development of nanoelectronics, the studies of methods of nanorelief surface formation in different materials, in particular polymers are very important. Organic polymer films in consequence of their dielectric and optical properties have been used as basis of these devices. In this paper, the possibility of UV optical record and electron beam lithography in different type of polymeric films was studied. Mechanisms of molecular structure changes: photoisomerization, destruction, cross-linking and oxidation have been discussed. The results of UV illumination of polyurethanes, polyacrylates, and some block-copolymers were described. The element analysis of polybutadiene block copolymer was performed before and after UV illumination, and the changes in optical transmission spectra of the polymer film were measured. The resolution of electron beam lithography on polymeric films also was studied.

Recently a number of organic and inorganic materials have been studied for direct surface-relief formation during the exposure process by a light or e-beam. It is very promising for practical application enabling the possibility to simplify the surface-relief formation technology.In this report the method of preparation of thin polymer-chalcogenide and polymer-azobenzene composite films is described, and some features of photoinduced changes of optical properties and holographic recording of these materials are studied.Films of composites were obtained from solution of arsenic sulphide, Disperse red 1 and polymers in organic solvents. The solution was spread on glass substrate and dried. The dry film thickness was in the range of 3-10 µm, with different correlation of arsenic sulphide, Disperse red 1 and polymers.The absorption spectres of these films was studied and described.The holographic recording of diffraction gratings was performed by different laser lines (442, 532 nm). During recording the diffraction efficiency was measured simultaneously in transmission and reflection mode. The profiles of the gratings and expositing area were analyzed by AFM microscope. Microanalysis of exposed and unexposed films showed a difference in chemical composition that can be explained by transfer of matter under the action of light.