Tin
monoxide (SnO) has attracted much attention as a p-type transparent
conducting oxide (TCO) with high hole mobility, which was attributed
to its relatively delocalized valence band. Nominally undoped SnO
can achieve a free hole concentration of >1018 cm–3 due to the low formation energy of the Sn vacancy
acceptor. Although
several calculations showed that many acceptors have low formation
energies and were considered efficient acceptors in SnO, very few
experimental works have been reported. In this work we explore the
electrical and optical properties of Ga- and Na-doped SnO thin films
synthesized by room temperature magnetron sputtering. We find that
all as-grown films are amorphous and insulating but become polycrystalline
with a tetragonal structure after post-growth rapid thermal annealing
(RTA) at temperatures >400 °C. While the resistivity ρ
of pure phase SnO is slightly lowered from ∼0.9 Ω·cm
for undoped to ∼0.2 Ω·cm with 1.2% Ga doping, a
much lower ρ of ∼0.01 Ω·cm with a high hole
concentration of 4–5 × 1019 cm–3 and a high mobility of >10 cm2/(V·s) can be achieved
with ∼2.3–2.8% Na doping. However, the visible transparency T
vis of these highly p-type SnO:Na is only ∼50%,
lower than the ∼65% of SnO:Ga films. This is likely due to
the presence of excess Sn in SnO:Na films. Detailed variable temperature
Hall measurements reveal that the acceptor ionization energies for
the substitutional Ga and Na (GaSn and NaGa)
to be 52 ± 3 and 20 ± 5 meV, respectively. Moreover, all
films have a wide band gap of ∼2.7–2.9 eV. We believe
that with further optimization in the growth and annealing process,
SnO:Na films with ρ < 10–2 Ω·cm
and T
vis > 65% can be realized. These
results demonstrate that Ga and Na are effective acceptors in SnO,
where Na acceptor has a lower formation as well as ionization energies
and, hence, can achieve a higher free hole concentration and lower
resistivity. Therefore, with appropriate doping, SnO is a high-performance
p-type transparent oxide that has technological potential for the
advancement of transparent optoelectronics.