Vacuum-deposited thin films with specific thickness profiles

Hodgkinson, Ian J.

doi:10.1016/s0042-207x(78)80420-5

Search citation statements

Order By: Relevance

Paper Sections

Select...

Aluminum Alloys1

Citation Types

Supporting

Mentioning

Contrasting

Year Published

1994

1998

Publication Types

Select...

Book3

Relationship

Self Cite0

Independent3

Authors

Journals

Cited by 3 publications

(1 citation statement)

References 4 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…• Soak in solution of 5% NaOH by weight at 70 In etching 6061-T6 aluminum alloys for barrier anodization the following cleaning/polishing procedure has been used: [118] [172] • 5% NaOH by weight at [70][71][72][73][74][75] An aluminum surface can be smoothed ("brightened") by dipping in 10% HCl followed by a thorough rinse in deionized water. Aluminum surfaces can be roughened and their chemical composition altered to allow better adhesion when the surface is adhesively bonded.…”

Section: Aluminum Alloysmentioning

confidence: 99%

The Low-Pressure Gas and Vacuum Processing Environment

Mattox¹

1998

Handbook of Physical Vapor Deposition (PVD) Processing

View full text Add to dashboard Cite

Section: Aluminum Alloysmentioning

confidence: 99%

The Low-Pressure Gas and Vacuum Processing Environment

Mattox¹

1998

Handbook of Physical Vapor Deposition (PVD) Processing

View full text Add to dashboard Cite

Vacuum Evaporation and Vacuum Deposition

Mattox¹

1998

Handbook of Physical Vapor Deposition (PVD) Processing

View full text Add to dashboard Cite

Vacuum Deposition, Reactive Evaporation, and Gas Evaporation

Mattox¹

1994

Surface Engineering

View full text Add to dashboard Cite

This article discusses the fundamentals of thermal vaporization and condensation and provides information on the various vaporization sources and methods of vacuum deposition. It offers an overview of reactive evaporation and its deposition techniques. The article also explains the advantages, limitations, and applications of vacuum deposition processes. Finally, it provides information on the gas evaporation process, its processing chamber, and related systems.

show abstract

Vacuum-deposited thin films with specific thickness profiles

Cited by 3 publications

References 4 publications

The Low-Pressure Gas and Vacuum Processing Environment

The Low-Pressure Gas and Vacuum Processing Environment

Vacuum Evaporation and Vacuum Deposition

Vacuum Deposition, Reactive Evaporation, and Gas Evaporation

Contact Info

Product

Resources

About