2017
DOI: 10.1002/adma.201700439
|View full text |Cite
|
Sign up to set email alerts
|

Van der Waals Epitaxial Growth of Atomic Layered HfS2 Crystals for Ultrasensitive Near‐Infrared Phototransistors

Abstract: As a member of the group IVB transition metal dichalcogenides (TMDs) family, hafnium disulfide (HfS ) is recently predicted to exhibit higher carrier mobility and higher tunneling current density than group VIB (Mo and W) TMDs. However, the synthesis of high-quality HfS crystals, sparsely reported, has greatly hindered the development of this new field. Here, a facile strategy for controlled synthesis of high-quality atomic layered HfS crystals by van der Waals epitaxy is reported. Density functional theory ca… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3
1
1

Citation Types

8
111
3

Year Published

2018
2018
2022
2022

Publication Types

Select...
7
1

Relationship

0
8

Authors

Journals

citations
Cited by 113 publications
(122 citation statements)
references
References 37 publications
8
111
3
Order By: Relevance
“…[ 19 ] The mica substrate plays an important role in the synthesis process for its high thermal stability, excellent chemical inertness, and free of dangling bonds which facilitate the van der Waals epitaxial growth regardless of the lattice mismatch. [ 20,21 ] Due to the weak van der Waals interaction between VS 2 and mica substrate, it is easy to transfer the as‐synthesized material to arbitrary substrates, such as SiO 2 /Si substrate, as shown in Figure 1e and Figure S1, Supporting Information. Atomic force microscope (AFM) was employed to determine the thickness of VS 2 nanosheet, and the step height of ≈0.6 nm demonstrates that the as‐synthesized products are monolayer (Figure 1f).…”
Section: Resultsmentioning
confidence: 99%
“…[ 19 ] The mica substrate plays an important role in the synthesis process for its high thermal stability, excellent chemical inertness, and free of dangling bonds which facilitate the van der Waals epitaxial growth regardless of the lattice mismatch. [ 20,21 ] Due to the weak van der Waals interaction between VS 2 and mica substrate, it is easy to transfer the as‐synthesized material to arbitrary substrates, such as SiO 2 /Si substrate, as shown in Figure 1e and Figure S1, Supporting Information. Atomic force microscope (AFM) was employed to determine the thickness of VS 2 nanosheet, and the step height of ≈0.6 nm demonstrates that the as‐synthesized products are monolayer (Figure 1f).…”
Section: Resultsmentioning
confidence: 99%
“…As shown in Figure c, the HfS 2 phototransistor exhibits an ultrahigh responsivity in excess of 3.08 × 10 5 A W −1 , ultrahigh photogain exceeding 4.72 × 10 5 , and ultrahigh detectivity over 4 × 10 12 Jones, which is superior to the vast majority of the reported 2D TMDs‐based IR phototransistors . Such outstanding performance might be attributed to the high crystal quality and superior field effect transistor properties of a competitive mobility of 7.6 cm 2 V −1 s −1 and an ultrahigh on/off ratio exceeding 10 8 , which minimize the defect density, the deleterious effects of defects and trap states, and facilitate photogenerated carriers transport in the HfS 2 channel . More recently, the 2D noble metal dichalcogenides PtSe 2 is also emerging in IR photodetection .…”
Section: Individual 2d Metal Chalcogenides For Ir Photodetectionmentioning
confidence: 94%
“…Abnormally, a large anomalous current emerged in the Td‐WTe 2 photodetector at the illumination of 3.8 µm due to light‐induced surface bandgap opening . Meanwhile, as an another important member of the 2D TMDs family, 2D HfS 2 (indirect bandgap ≈ 1.45 eV) shows remarkable optical response in IR detection . As shown in Figure c, the HfS 2 phototransistor exhibits an ultrahigh responsivity in excess of 3.08 × 10 5 A W −1 , ultrahigh photogain exceeding 4.72 × 10 5 , and ultrahigh detectivity over 4 × 10 12 Jones, which is superior to the vast majority of the reported 2D TMDs‐based IR phototransistors .…”
Section: Individual 2d Metal Chalcogenides For Ir Photodetectionmentioning
confidence: 98%
See 1 more Smart Citation
“…Recently HfS 2 has started being explored as an alternative to MoS 2 and WSe 2 due to its superior carrier mobility up to 1800 cm 2 V −1 s −1 and current density 100 times higher than that of MoS 2 . Wang et al demonstrate for the first time an HfS 2 photodetector in PET substrate .…”
Section: Progress Of 2d Materials Flexible Photodetectors Architecturesmentioning
confidence: 99%