2015
DOI: 10.1109/ted.2015.2451993
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Vanadium Oxide Thin-Film Variable Resistor-Based RF Switches

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Cited by 44 publications
(10 citation statements)
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“…Then the top metal layer (Ti 20 nm/Au 300 nm) is put on by ebeam evaporation and lift-off process. The measured XRD of the wafer and the SEM image of the VO 2 are shown in Figure 3 where the VO 2 film is formed at (0, 2, 0) on a SiO 2 surface compared to (0, 1, 1) on a sapphire surface in the previous research [14]. Before the electrical test, a layer of photoresist is used to cover the VO 2 area with only metal contact exposed to the air.…”
Section: Introductionmentioning
confidence: 97%
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“…Then the top metal layer (Ti 20 nm/Au 300 nm) is put on by ebeam evaporation and lift-off process. The measured XRD of the wafer and the SEM image of the VO 2 are shown in Figure 3 where the VO 2 film is formed at (0, 2, 0) on a SiO 2 surface compared to (0, 1, 1) on a sapphire surface in the previous research [14]. Before the electrical test, a layer of photoresist is used to cover the VO 2 area with only metal contact exposed to the air.…”
Section: Introductionmentioning
confidence: 97%
“…In order to make this property useful in microelectronics, ideally the resistivity ratio between these two phases needs to be as high as possible. A pulsed laser deposition (PLD) process has been developed by our group to obtain high quality VO 2 thin films on sapphire [14] and silicon dioxide substrates. In this study, a tunable inductor is implemented using VO 2 thin film switches, utilizing the large resistivity change between the insulating and conducting states, Compared to other tunable inductor structures [1][2][3][4], designs in this article use only a single layer of VO 2 to accomplish tunability.…”
Section: Introductionmentioning
confidence: 99%
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“…Hillman et al [62] demonstrated inverted microstrip line type device with integrated heater. Pan et al [63] implemented CPW series type RF device with an integrated heater as shown in Figure 9, the same time of the device was demonstrated earlier with an external heater [60]. Pt heater is fabricated on top of VO 2 CPW structure with silicon dioxide (SiO 2 ) as isolation layer.…”
Section: Thermally Triggered Rf Switchesmentioning
confidence: 94%
“…In recent years, with the development of phase change materials, it has been found that the optical properties of VO 2 phase change material change with temperature. Therefore, VO 2 materials are gradually applied to achieve dynamic tunability of optical devices [1,2,3] and RF electronics [4,5]. The VO 2 phase transition is generally considered as an insulator-metal phase transition, which includes the insulator state, metallic state and the transition state between them.…”
Section: Introductionmentioning
confidence: 99%