Variability in Plasma Polymerization Processes – An International Round‐<scp>R</scp>obin Study

Whittle, Jason D.; Short, Robert D.; Steele, David A.; Bradley, James W.; Bryant, Paul M.; Jan, Faiq; Biederman, Hynek; Serov, A.; Choukurov, Andrei; Hook, Andrew L.; Ciridon, Winston; Ceccone, Giacomo; Hegemann, Dirk; Körner, Enrico; Michelmore, Andrew

doi:10.1002/ppap.201300029

Cited by 40 publications

(31 citation statements)

References 44 publications

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“…The latter strongly influences, for example, the cross‐linking of plasma polymer films and their functional group density . A round‐robin study initiated by the Mawson Institute in Adelaide, Australia (conducted in 2012/2013) thus revealed a high variability in plasma polymerization processes (both in deposition rate and chemical functionality) using acrylic acid as monomer at nominally fixed plasma parameters within 14 different plasma reactors …”

Section: Introductionmentioning

confidence: 99%

Deposition of Functional Plasma Polymers Influenced by Reactor Geometry in Capacitively Coupled Discharges

Hegemann

Michlíček

Blanchard

et al. 2015

Plasma Process. Polym.

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The deposition of functional plasma polymers such as a‐C:H:O films is mainly influenced by fragmentation of the parent molecules in the gas phase as well as by the energetic conditions during film growth at the surface. The influence of gas phase and surface processes on the a‐C:H:O film properties was thus investigated in order to optimize cross‐linking and functional group density. The control of both conditions enables permanent functional plasma polymer films deposited within different reactor geometries (capacitively coupled symmetric vs. asymmetric at driven electrode and at grounded electrode). Comparison and up‐scaling of such plasma polymerization processes are facilitated by knowing the internal energy input into the plasma and into the growing film surface.

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Section: Introductionmentioning

confidence: 99%

Deposition of Functional Plasma Polymers Influenced by Reactor Geometry in Capacitively Coupled Discharges

Hegemann

Michlíček

Blanchard

et al. 2015

Plasma Process. Polym.

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“…11,12 Apart from its extensive use in low-pressure plasma polymerization, W/FM is currently used by several research groups as a deposition parameter for atmospheric pressure plasma polymerization, [13][14][15][16][17][18][19][20][21] where the precursor is diluted in an inert gas. 11,12 Apart from its extensive use in low-pressure plasma polymerization, W/FM is currently used by several research groups as a deposition parameter for atmospheric pressure plasma polymerization, [13][14][15][16][17][18][19][20][21] where the precursor is diluted in an inert gas.…”

Section: Introductionmentioning

confidence: 99%

Evaluation of the Yasuda parameter for the atmospheric plasma deposition of allyl methacrylate

et al. 2015

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This work studies the influence of the proportional change in discharge power and the monomer feed on the morphology and the chemistry of atmospheric plasma deposited films. Atmospheric plasma coatings of allyl methacrylate were deposited using dielectric barrier discharge plasma under different conditions but always under the same ratio between the discharge power and monomer feed (W/FM). It is shown that a constant W/FM does not necessarily provide the same chemistry and the same morphology for atmospheric pressure plasma. This is explained by the higher discharge power of the plasma resulting in an increase of streamers which alter the distribution of energy among the plasma species. On the surface of the deposited coatings, globular-like features were observed, which are suggested to be formed in the volume of the discharge. The deposition rate is also influenced. providing thicker coatings, when high monomer feed/high power are used. Finally, infrared spectra showed a higher retention of the ester functionality at high power/high monomer feed.

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“…These parameters provide sufficient control over the deposition process required for many applications. However, to expand the breadth of opportunities that plasma polymer films provide, a better understanding of the processes occurring during deposition and the mechanisms of film formation is required …”

Section: Introductionmentioning

confidence: 99%

A Mechanistic Study of the Plasma Polymerization of Ethanol

Hazrati

Whittle

Vasilev

2014

Plasma Processes & Polymers

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Plasma polymer thin films are useful in a variety of different fields. In this article, the fragmentation of ethanol during plasma polymerization at different discharge powers (2-32 W) is described. The positive ion mass spectrometry data of the plasma phase demonstrated formation of oligomeric species of the and [4MþH] þ . At the same time, there was abundant fragmented species most dominant being ethylene C 2 H 4 , acetylene C 2 H 2 , water H 2 O, and hydrogen H 2 . X-ray photoelectron spectroscopy was used to relate the mass spectroscopy data of the plasma to the chemistry of the deposited films. Depletion of oxygen in the deposit correlated with greater fragmentation in the plasma phase at higher plasma power.

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Variability in Plasma Polymerization Processes – An International Round‐Robin Study

Cited by 40 publications

References 44 publications

Deposition of Functional Plasma Polymers Influenced by Reactor Geometry in Capacitively Coupled Discharges

Deposition of Functional Plasma Polymers Influenced by Reactor Geometry in Capacitively Coupled Discharges

Evaluation of the Yasuda parameter for the atmospheric plasma deposition of allyl methacrylate

A Mechanistic Study of the Plasma Polymerization of Ethanol

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