1980
DOI: 10.1016/0039-6028(80)90374-x
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Variations of work function and surface conductivity on clean cleaved zinc oxide surfaces by annealing and by hydrogen adsorption

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Cited by 82 publications
(65 citation statements)
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“…Under these conditions and after 15 min Ar-sputtering, the work function of CuGaSe 2 is 4.96 eV. For the highly n-doped ZnO we determine a work function of 4.26 eV, in reasonable agreement with results from Moormann et al [36]. Up to a sputtering time of 30 min only the work function of the p-type semiconductors changes significantly.…”
Section: Cross-sectional Studies On Complete Devicessupporting
confidence: 79%
“…Under these conditions and after 15 min Ar-sputtering, the work function of CuGaSe 2 is 4.96 eV. For the highly n-doped ZnO we determine a work function of 4.26 eV, in reasonable agreement with results from Moormann et al [36]. Up to a sputtering time of 30 min only the work function of the p-type semiconductors changes significantly.…”
Section: Cross-sectional Studies On Complete Devicessupporting
confidence: 79%
“…Using an electron affinity of ϭ4.1 eV and a band gap of 1.67 eV, the position of the Fermi energy results to 0.8 eV above the valence band maximum, in agreement with slightly Ga rich CGSe samples. 10 For the highly n-doped ZnO we determine a work function of 4.26 eV, in reasonable agreement with results from Moormann et al 11 In Fig. 3 it can also be seen, that up to a sputtering time of 30 min only the p-type semiconductors change the work function significantly.…”
supporting
confidence: 79%
“…1-5͔͒ shows that stable and rectifying metal contacts to ZnO remain a challenge. Indeed, surface traps, adsorbates, 3,4 processing, 1,5 hydrogen, 6 orientation, and surface dipoles 7 can all affect ZnO's surface and interface properties. Here we use nanoscale depth-resolved cathodoluminescence spectroscopy ͑DRCLS͒ coupled with surface science and electronic transport techniques to separate these extrinsic effects and show that near-interface native defects, both resident in the bulk and created by metallization, dominate rectification, recombination, and tunneling features of the metal-ZnO contact.…”
mentioning
confidence: 99%