Vector Analysis of Diffractive Optical Elements for Off-Axis Illumination of Projection Lithographic System

Wei, 张巍 Zhang; Yan, 巩岩 Gong

doi:10.3788/aos201131.1005002

Cited by 4 publications

(2 citation statements)

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“…The technology of FlexRay illumination system based on thousands of micro mirrors originated in the early 21st century, and was first developed and successfully applied by Dutch company ASML [4][5][6][7][8][9]. In fact, the setting error of optical elements in the illumination system will affect the sources quality.…”

Section: Priciple Of the Measurement Of Flexray Pupil Shaping Module ...mentioning

confidence: 99%

Performance measurement of FlexRay pupil shaping module in lithography system

zenghui,

Fang,

Jingpei

et al. 2023

AOPC 2023: Optical Sensing, Imaging, and Display Technology and Applications; And Biomedical Optics

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Section: Priciple Of the Measurement Of Flexray Pupil Shaping Module ...mentioning

confidence: 99%

Performance measurement of FlexRay pupil shaping module in lithography system

zenghui,

Fang,

Jingpei

et al. 2023

AOPC 2023: Optical Sensing, Imaging, and Display Technology and Applications; And Biomedical Optics

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“…[1][2][3][4][5][6][7][8] Single traditional diffractive optical elements have strong negative dispersion characteristics. In order to overcome the disadvantages of huge optical chromatic aberration of diffractive optical elements, the concept of the harmonic diffractive elements was developed in 1995.…”

Section: Introductionmentioning

confidence: 99%

Effects on Polychromatic Integral Diffraction Efficiency for Dual-wavebands Harmonic Diffractive Optical Elements

Chang¹,

Yi²

2018

Proceedings of the 2017 4th International Conference on Machinery, Materials and Computer (MACMC 2017)

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Abstract. Harmonic diffractive optical elements(HDOEs) can make multiple-wavebands imaged on the same image plane, which have be widely used in the infrared imaging optical systems. The mathematical model of effects on diffraction efficiency and polychromatic integral diffraction efficiency(PIDE) caused by single point diamond turning processing for dual-wavebands harmonic diffractive optical elements have been set up. And the expressions on diffraction efficiency and PIDE by machining errors including micro-structure heights and widths have been deduced. In order to make the maximum PIDE value over the dual-wavebands, the machining errors should be designed and distributed. Based on the above analysis, the dual-waveband harmonic diffractive optical elements used in 3.7um-4.3um and 8.7um-8.7um wavebands have been analyzed and simulated with MATLAB software on the two conditions including the oblique incidence and general incident distributions for the machining errors, which can be directly used to evaluate broadband hybrid diffractive-reflective optical systems imaging quality. Through the relationship between PIDE and machining errors of dual-wavebands HDOEs, the optical modulation transfer function can be analyzed. The results can be applied to dual band imaging optical systems for controlling the harmonic diffractive optical element processing and machining errors as well as the incident angle design for the hybrid diffractive-reflective optical systems.

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Complementary Metal‐Oxide Semiconductor and Memristive Hardware for Neuromorphic Computing

Azghadi

Chen

Eshraghian

et al. 2020

Advanced Intelligent Systems

103

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The ever‐increasing processing power demands of digital computers cannot continue to be fulfilled indefinitely unless there is a paradigm shift in computing. Neuromorphic computing, which takes inspiration from the highly parallel, low‐power, high‐speed, and noise‐tolerant computing capabilities of the brain, may provide such a shift. Many researchers from across academia and industry have been studying materials, devices, circuits, and systems, to implement some of the functions of networks of neurons and synapses to develop neuromorphic computing platforms. These platforms are being designed using various hardware technologies, including the well‐established complementary metal‐oxide semiconductor (CMOS), and emerging memristive technologies such as SiOx‐based memristors. Herein, recent progress in CMOS, SiOx‐based memristive, and mixed CMOS‐memristive hardware for neuromorphic systems is highlighted. New and published results from various devices are provided that are developed to replicate selected functions of neurons, synapses, and simple spiking networks. It is shown that the CMOS and memristive devices are assembled in different neuromorphic learning platforms to perform simple cognitive tasks such as classification of spike rate‐based patterns or handwritten digits. Herein, it is envisioned that what is demonstrated is useful to the unconventional computing research community by providing insights into advances in neuromorphic hardware technologies.

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Vector Analysis of Diffractive Optical Elements for Off-Axis Illumination of Projection Lithographic System

Cited by 4 publications

References 0 publications

Performance measurement of FlexRay pupil shaping module in lithography system

Performance measurement of FlexRay pupil shaping module in lithography system

Effects on Polychromatic Integral Diffraction Efficiency for Dual-wavebands Harmonic Diffractive Optical Elements

Complementary Metal‐Oxide Semiconductor and Memristive Hardware for Neuromorphic Computing

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