2019
DOI: 10.1021/acs.nanolett.8b05140
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Vertical MoS2 Double-Layer Memristor with Electrochemical Metallization as an Atomic-Scale Synapse with Switching Thresholds Approaching 100 mV

Abstract: Atomically thin two-dimensional (2D) materialssuch as transition metal dichalcogenide (TMD) monolayers and hexagonal boron nitride (hBN)and their van der Waals layered preparations have been actively researched to build electronic devices such as field-effect transistors, junction diodes, tunneling devices, and, more recently, memristors. Twodimensional material memristors built in lateral form, with horizontal placement of electrodes and the 2D material layers, have provided an intriguing window into the mo… Show more

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Cited by 346 publications
(288 citation statements)
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“…Long‐term retention (10 3 s) was measured after ten consecutive negative pulses (pulse width:100 ns, amplitude: −4 V), as shown in Figure 3j. The energy consumption of our flexible MoS 2 ‐based device was compared with other synapses, including biological and electronic synapses, [ 5,6,10,44,46–56 ] and its advantages are demonstrated in Figure 3k. The energy consumption of our synaptic device was orders of magnitude lower than that of biological systems (10 fJ per synaptic event).…”
Section: Figurementioning
confidence: 99%
“…Long‐term retention (10 3 s) was measured after ten consecutive negative pulses (pulse width:100 ns, amplitude: −4 V), as shown in Figure 3j. The energy consumption of our flexible MoS 2 ‐based device was compared with other synapses, including biological and electronic synapses, [ 5,6,10,44,46–56 ] and its advantages are demonstrated in Figure 3k. The energy consumption of our synaptic device was orders of magnitude lower than that of biological systems (10 fJ per synaptic event).…”
Section: Figurementioning
confidence: 99%
“…As shown in Figure 4(f), the resistance of VOCl based memristive device gradually shows an increase or a reduction with consecutive negative (−1.15 V, 500 µs) or positive (1.6 V, 50 µs) voltage pulses, respectively. This suggests that our VOCl based memristors have potential applications in neuromorphic computing [48,[52][53][54][55][56][57].…”
Section: Resultsmentioning
confidence: 85%
“…In fact, various working principles and structure-property relations exist despite the structural similarity of 2D TMDs. For instance, 2D TMD-based vertical memristive devices are able to tune multiple resistances by forming and rupturing conductive filaments through the migration of ions stemming from their electrodes ( Dev et al., 2020 ; Xu et al., 2019 ). The spatial pathways of these ions can be further tuned by the intrinsically existing in-plane grain boundaries of 2D TMD layers ( Sangwan et al., 2015 ), as well as by the externally introduced intercalations in between each 2D layer ( Zhang et al., 2019 ; Zhu et al., 2019 ).…”
Section: Promise Of 2d Materials For Neuromorphic Applicationmentioning
confidence: 99%
“…Their desirable properties, including atomic thickness, dangling-bond-free surfaces, mechanical strength, high integration density, tunable electrical transport, and optical properties, as well as low energy consumption, make them ideal candidates for applications in a wide range of electronic devices ( Gupta et al., 2015 ; Mas-Ballesté et al., 2011 ; Xia et al., 2017 ). More recently, the applications of 2D materials have been extensively studied for energy-efficient and high-performing artificial synapses ( Arnold et al., 2017 ; Chen et al., 2019c ; Dev et al., 2020 ; Hu et al., 2019 ; Jiang et al., 2017 ; Kalita et al., 2019 ; Kim et al., 2019c ; Krishnaprasad et al., 2019 ; Kumar et al., 2019 ; Li et al., 2018 ; Liu et al., 2019 ; Mao et al., 2019 ; Paul et al., 2019 ; Pradhan et al., 2020 ; Xie et al., 2018a , 2018b ; Xu et al., 2019 ; Yan et al., 2019a ; Yi et al., 2018 ; Zhu et al., 2019 ). Furthermore, owing to their dangling-bonds-free surface and atomically thin nature, a variety of 2D materials-based heterostructures have been developed in spite of their lattice mismatch ( Novoselov et al., 2016 ).…”
Section: Introductionmentioning
confidence: 99%
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