Viscosity of a Thin Film of UV Curable Resin in Pentafluoropropane

Hiroshima, Hiroshi; Atobe, Hidemasa; Wang, Qing

doi:10.2494/photopolymer.23.45

Cited by 25 publications

(13 citation statements)

References 6 publications

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“…11) Recently, several advantages and disadvantages were reported concerning UV nanoimprinting using PFP. [12][13][14][15][16][17][18] PFP offers the advantages of the rapid resin filling, 12) decreased resin viscosity, 13) decreased demolding force and release energy, 14) and suppression of mold pollution arising from resin adsorption. 15) In contrast, PFP also has the disadvantages of the decreased cured film thickness 16) and resist pattern width.…”

Section: Introductionmentioning

confidence: 99%

Reverse-tone ultraviolet nanoimprint lithography with fluorescent UV-curable resins

Uehara

Kubo

Nakagawa

2015

Jpn. J. Appl. Phys.

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The usefulness of fluorescent ultraviolet (UV)-curable resins for reverse-tone UV nanoimprint lithography was demonstrated. Nanoimprinted concave patterns were fabricated as an underlayer on a Au-deposited substrate using a fluorescent UV-curable resin with a low etching durability after curing. The underlayer was coated with another fluorescent UV-curable resin with a high etching durability after curing. Fluorescence microscopic observation allowed the inspection of the morphological uniformity and thickness of both under and top layers in a nondestructive manner. UV-curing of the top layer in combination with pressing with a flat substrate was necessary for obtaining a flattened top layer surface, which was responsible for allowing the reverse-tone UV nanoimprint lithography. We demonstrated the fabrication of 10-nm-thick Au split-ring resonator structures with a line width of 55 + 4 nm corresponding to the underlayer concave resist patterns by dry etching during Ar ion milling under the condition that the etching rate ratio of the underlayer to the top layer was 6.

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Section: Introductionmentioning

confidence: 99%

Reverse-tone ultraviolet nanoimprint lithography with fluorescent UV-curable resins

Uehara

Kubo

Nakagawa

2015

Jpn. J. Appl. Phys.

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“…The condensable gas eliminates nonfill defects generated by trapped gas bubbles because PFP condenses to the liquid state at an increased pressure of 0.15 MPa at room temperature. 25 UV nanoimprinting in PFP has the unique advantages of rapid filling 26 and the viscosity reduction 27 of UV-curable resins, the reduction of demolding forces, 28 and the resistance of resin component adsorption on fluorinated silica molds. 29 We demonstrated that tridecafluoro- 1,1,2,2-tetrahydrooctan-1-ol functioned as the most effective additive to an acrylate-type UV-curable resin in air, while a longer fluoroalkyl chain made heptafluoro-1,1,2,2-tetrahydrodecan-1-ol the most effective additive in PFP.…”

Section: Introductionmentioning

confidence: 99%

Investigation of Fluorinated (Meth)Acrylate Monomers and Macromonomers Suitable for a Hydroxy-Containing Acrylate Monomer in UV Nanoimprinting

et al. 2014

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We investigated reactive fluorinated (meth)acrylate monomers and macromonomers that caused segregation at the cured resin surface of a viscous hydroxy-containing monomer, glycerol 1,3-diglycerolate diacrylate (GDD), and decreased the demolding energy in ultraviolet (UV) nanoimprinting with spin-coated films under a condensable alternative chlorofluorocarbon gas atmosphere. The X-ray photoelectron spectroscopy and contact angle measurements used to determine the surface free energy suggested that a nonvolatile silicone-based methacrylate macromonomer with fluorinated alkyl groups segregated at the GDD-based cured resin surface and decreased the surface free energy, while fluorinated acrylate monomers hardly decreased the surface free energy because of their evaporation during the annealing of the spin-coated films. The average demolding energy of GDD-based cured resins with the macromonomer having fluorinated alkyl groups was smaller than that with the macromonomer having hydrocarbon alkyl groups. The fluorinated alkyl groups were responsible for decreasing the demolding energy rather than the polysiloxane main chains. We demonstrated that the GDD-based UV-curable resin with the fluorinated silicone-based macromonomer was suitable for step-and-repeat UV nanoimprinting with a bare silica mold, in addition to silica molds treated by chemical vapor surface modification with trifluoro-1,1,2,2-tetrahydropropyltrimethoxysilane (FAS3) and tridecafluoro-1,1,2,2-tetrahydrooctyltrimethoxysilane (FAS13).

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“…Recently, it has been reported that several physicochemical properties of UV-curable and cured resins are affected by the use of PFP in UV nanoimprinting. [11][12][13][14][15] PFP causes a decrease in demolding forces, 11) a decrease in the viscosity of a resin thin film spin-coated on a silicon wafer, 12) a large decrease in a film thickness after curing of a UV-curable resin, 13) an increase in wettability of a UV-curable resin on a silicon wafer, 14) and a decrease in adsorption of resin components onto a fluorinated mold surface. 15) The decreases in demolding force and resin adsorption onto the mold surface are desirable to reduce mechanical stress to the mold.…”

Section: Introductionmentioning

confidence: 99%

Morphological Changes in Ultraviolet-Nanoimprinted Resin Patterns Caused by Ultraviolet-Curable Resins Absorbing Pentafluoropropane

Kaneko

Kobayashi

Tsukidate

et al. 2012

Jpn. J. Appl. Phys.

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In this article, we revealed the maximum values of pentafluoropropane (PFP) absorbed by acrylate-type monomers and UV-curable resins causing radical photopolymerization and measured the viscosities in a state saturated with PFP. We described the influences of PFP condensable gas effectively used in UV nanoimprinting on the morphologies of resin patterns fabricated by UV nanoimprinting. The weights of the resins and monomers were increased by exposure to a PFP atmosphere, while the viscosities were reduced markedly. The absorption of PFP depended on the chemical structures of the monomers. The solubility parameter calculated by the Hoy method clearly suggested that the monomer with a solubility parameter of 20 (J cm-3)1/2 absorbed the most PFP. The UV-curable resin composed of the monomer absorbing a large amount of PFP resulted in morphological changes in nanoimprinted resin patterns where the height was lowered and the outermost surface became rough. The UV-curable resins having hydroxyl groups play an important role in preserving the size fidelity of UV-nanoimprinted resin patterns.

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Viscosity of a Thin Film of UV Curable Resin in Pentafluoropropane

Cited by 25 publications

References 6 publications

Reverse-tone ultraviolet nanoimprint lithography with fluorescent UV-curable resins

Reverse-tone ultraviolet nanoimprint lithography with fluorescent UV-curable resins

Investigation of Fluorinated (Meth)Acrylate Monomers and Macromonomers Suitable for a Hydroxy-Containing Acrylate Monomer in UV Nanoimprinting

Morphological Changes in Ultraviolet-Nanoimprinted Resin Patterns Caused by Ultraviolet-Curable Resins Absorbing Pentafluoropropane

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