No abstract

A new spectrophotometer system is developed for the study on thermal radiation phenomena of real surfaces. This system can measure spectra of reflection and emission of radiation at 93 wavelength points in the near-ultraviolet to infrared region of λ = 0.30-11 µm on one system simultaneously and repeatedly with a cycle time of 2 s. The system is applied to investigate the transition of spectra of reflection and emission of a metal surface in a high-temperature air-oxidation process. It is demonstrated that interference and diffraction behaviour, which is caused by the change in microstructure of the surface, is clearly observed as a simple and systematic change of the spectra over the wide spectral region. The suitability of the developed system for the study of radiation phenomena is demonstrated. It is also suggested that a real-time technique can be developed on the basis of the performance of the developed system to diagnose the temperature and microstructure of real surfaces. Nomenclature

UV nanoimprint in air and in pentafluoropropane (PFP) was carried out at imprint pressures ranging from 200 down to 10 kPa using a mold with fractal structure recesses with nominal sizes of 1.3, 3.9, 11.7, 35, 105, and 316 µm. While UV nanoimprint in air suffered severe bubble defect problems, UV nanoimprint in PFP was free from the bubble defect problem even at 10 kPa. From real-time monitoring of recesses being filled with resin for UV nanoimprint in PFP, it was found that the recesses are filled in the ascending order of sizes and filling is completed in 2–4 s. No imprint pressure by the imprint apparatus is needed for UV nanoimprint in PFP, and a full wetting can be spontaneously realized even at a concave area where a large amount of gas is liable to be trapped. This suggests that a capillary force must play an important role of filling at the initial stage of contact and filling between unparallel surfaces of the mold and wafer.